发明授权
US07868304B2 Method for removal of deposition on an optical element, lithographic apparatus, device manufacturing method, and device manufactured thereby
有权
用于去除光学元件上的沉积的方法，光刻设备，器件制造方法以及由此制造的器件
- 专利标题： Method for removal of deposition on an optical element, lithographic apparatus, device manufacturing method, and device manufactured thereby
- 专利标题（中）： 用于去除光学元件上的沉积的方法，光刻设备，器件制造方法以及由此制造的器件
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申请号： US11051477申请日： 2005-02-07
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公开(公告)号： US07868304B2公开(公告)日： 2011-01-11
- 发明人: Levinus Pieter Bakker , Vadim Yevgenyevich Banine , Johannes Hubertus Josephina Moors , Carolus Ida Maria Antonius Spee , Johannes Christiaan Leonardus Franken , Arnoud Cornelis Wassink , Paul Peter Anna Antonius Brom
- 申请人： Levinus Pieter Bakker , Vadim Yevgenyevich Banine , Johannes Hubertus Josephina Moors , Carolus Ida Maria Antonius Spee , Johannes Christiaan Leonardus Franken , Arnoud Cornelis Wassink , Paul Peter Anna Antonius Brom
- 申请人地址： NL Veldhoven
- 专利权人： ASML Netherlands B.V.
- 当前专利权人： ASML Netherlands B.V.
- 当前专利权人地址： NL Veldhoven
- 代理机构： Pillsbury Winthrop Shaw Pittman LLP
- 主分类号： A61N5/00
- IPC分类号： A61N5/00
摘要：
A method for removal of deposition on a radiation collector of a lithographic apparatus includes providing a gas barrier to an end of a radiation collector, thereby providing a radiation collector enclosure volume; providing a gas to the enclosure volume, the gas selected from a halogen containing gas and a hydrogen containing gas; and removing at least part of the deposition from the radiation collector. A lithographic apparatus includes a radiation collector; a circumferential hull enclosing the radiation collector; a gas barrier at an end of the radiation collector, thereby providing a radiation collector enclosure volume. The radiation collector is enclosed by the circumferential hull and the gas barrier. An inlet provides a gas to the radiation collector enclosure volume and an outlet removes a gas from the radiation collector enclosure volume.