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25 条记录 (耗时 0.036 秒)

    Illumination system and filter system
    6.
    发明授权
    Illumination system and filter system 失效
    照明系统和过滤系统

    公开(公告)号：US08269179B2

    公开(公告)日：2012-09-18

    申请号：US12318291

    申请日：2008-12-24

    申请人： Arnoud Cornelis Wassink ,  Levinus Pieter Bakker ,  Johannes Hubertus Josephina Moors ,  Frank Jeroen Pieter Schuurmans

    发明人： Arnoud Cornelis Wassink ,  Levinus Pieter Bakker ,  Johannes Hubertus Josephina Moors ,  Frank Jeroen Pieter Schuurmans

    IPC分类号： G03B27/52 ,  G03B27/72 ,  G01J3/10

    CPC分类号： G03F7/70916

    摘要： A lithographic apparatus includes an illumination system configured to condition a radiation beam, a projection system configured to project the radiation beam onto a substrate, and a filter system for filtering debris particles out of the radiation beam. The filter system includes a plurality of foils for trapping the debris particles, a support for holding the plurality of foils, and a cooling system having a surface that is arranged to be cooled. The cooling system and the support are positioned with respect to each other such that a gap is formed between the surface of the cooling system and the support. The cooling system is further arranged to inject gas into the gap.

    摘要翻译： 光刻设备包括被配置为调节辐射束的照明系统，配置成将辐射束投影到衬底上的投影系统，以及用于将碎屑颗粒从辐射束中过滤的过滤系统。 过滤器系统包括用于捕集碎片颗粒的多个箔，用于保持多个箔的支撑件，以及具有布置成要冷却的表面的冷却系统。 冷却系统和支撑件相对于彼此定位，使得在冷却系统的表面和支撑件之间形成间隙。 冷却系统还被布置成将气体注入到间隙中。

    Illumination system and filter system
    8.
    发明申请
    Illumination system and filter system 失效
    照明系统和过滤系统

    公开(公告)号：US20090115980A1

    公开(公告)日：2009-05-07

    申请号：US12318291

    申请日：2008-12-24

    申请人： Arnoud Cornelis Wassink ,  Levinus Pieter Bakker ,  Johannes Hubertus Josephina Moors ,  Frank Jeroen Pieter Schuurmans

    发明人： Arnoud Cornelis Wassink ,  Levinus Pieter Bakker ,  Johannes Hubertus Josephina Moors ,  Frank Jeroen Pieter Schuurmans

    IPC分类号： G03B27/52 ,  G01J3/10 ,  G03B27/72

    CPC分类号： G03F7/70916

    摘要： A lithographic apparatus includes an illumination system configured to condition a radiation beam, a projection system configured to project the radiation beam onto a substrate, and a filter system for filtering debris particles out of the radiation beam. The filter system includes a plurality of foils for trapping the debris particles, a support for holding the plurality of foils, and a cooling system having a surface that is arranged to be cooled. The cooling system and the support are positioned with respect to each other such that a gap is formed between the surface of the cooling system and the support. The cooling system is further arranged to inject gas into the gap.

    摘要翻译： 光刻设备包括被配置为调节辐射束的照明系统，配置成将辐射束投影到衬底上的投影系统，以及用于将碎屑颗粒从辐射束中过滤的过滤系统。 过滤器系统包括用于捕集碎片颗粒的多个箔，用于保持多个箔的支撑件，以及具有布置成要冷却的表面的冷却系统。 冷却系统和支撑件相对于彼此定位，使得在冷却系统的表面和支撑件之间形成间隙。 冷却系统还被布置成将气体注入到间隙中。

    APPARATUS COMPRISING A ROTATING CONTAMINANT TRAP
    9.
    发明申请
    APPARATUS COMPRISING A ROTATING CONTAMINANT TRAP 审中-公开
    包含旋转污染物捕获装置的装置

    公开(公告)号：US20110096308A1

    公开(公告)日：2011-04-28

    申请号：US12985014

    申请日：2011-01-05

    申请人： Johannes Christiaan Leonardus FRANKEN ,  Vadim Yevgenyevich Banine ,  Arnoud Cornelis Wassink

    发明人： Johannes Christiaan Leonardus FRANKEN ,  Vadim Yevgenyevich Banine ,  Arnoud Cornelis Wassink

    IPC分类号： G03B27/52

    CPC分类号： G03F7/70916 ,  B82Y10/00 ,  F16C32/0603 ,  F16C32/0685 ,  F16C33/02 ,  F16C33/72 ,  F16C2300/62 ,  G03F7/70033 ,  G03F7/70941

    摘要： A contaminant trap apparatus arranged in a path of a radiation beam to trap contaminants emanating from a radiation source configured to produce the radiation beam is disclosed. The contaminant trap apparatus includes a rotor having a plurality of channel forming elements defining channels which are arranged substantially parallel to the direction of propagation of the radiation beam, the rotor including electrically chargeable material and arranged to be electrically charged as a result of the operation of the radiation source; and a bearing configured to rotatably hold the rotor with respect to a rotor carrying structure, wherein the apparatus is configured to (i) control or redirect an electrical discharge of the rotor, or (ii) suppress an electrical discharge of the rotor, or (iii) both (i) and (ii).

    摘要翻译： 公开了一种布置在辐射束的路径中的污染捕集装置，用于捕获从被配置成产生辐射束的辐射源发出的污染物。 污染物捕集装置包括具有多个通道形成元件的转子，该多个通道形成元件限定了基本上平行于辐射束的传播方向布置的通道，该转子包括可充电的材料并且被布置为由于操作而导致带电 辐射源; 以及构造成相对于转子承载结构可旋转地保持转子的轴承，其中所述装置被配置为（i）控制或重定向转子的放电，或（ii）抑制转子的放电或（ iii）（i）和（ii）。

    Apparatus comprising a rotating contaminant trap
    10.
    发明授权
    Apparatus comprising a rotating contaminant trap 失效
    包括旋转污染物捕集器的装置

    公开(公告)号：US07889312B2

    公开(公告)日：2011-02-15

    申请号：US11525225

    申请日：2006-09-22

    申请人： Johannes Christiaan Leonardus Franken ,  Vadim Yevgenyevich Banine ,  Arnoud Cornelis Wassink

    发明人： Johannes Christiaan Leonardus Franken ,  Vadim Yevgenyevich Banine ,  Arnoud Cornelis Wassink

    IPC分类号： G03B27/52 ,  G03B27/54 ,  G03B27/72

    CPC分类号： G03F7/70916 ,  B82Y10/00 ,  F16C32/0603 ,  F16C32/0685 ,  F16C33/02 ,  F16C33/72 ,  F16C2300/62 ,  G03F7/70033 ,  G03F7/70941

    摘要： A contaminant trap apparatus arranged in a path of a radiation beam to trap contaminants emanating from a radiation source configured to produce the radiation beam is disclosed. The contaminant trap apparatus includes a rotor having a plurality of channel forming elements defining channels which are arranged substantially parallel to the direction of propagation of the radiation beam, the rotor including electrically chargeable material and arranged to be electrically charged as a result of the operation of the radiation source; and a bearing configured to rotatably hold the rotor with respect to a rotor carrying structure, wherein the apparatus is configured to (i) control or redirect an electrical discharge of the rotor, or (ii) suppress an electrical discharge of the rotor, or (iii) both (i) and (ii).

    摘要翻译： 公开了一种布置在辐射束的路径中的污染物捕集装置，用于捕获从被配置成产生辐射束的辐射源发出的污染物。 污染物捕集装置包括具有多个通道形成元件的转子，该多个通道形成元件限定了基本上平行于辐射束的传播方向布置的通道，该转子包括可充电的材料并且被布置为由于操作而导致带电 辐射源; 以及构造成相对于转子承载结构可旋转地保持转子的轴承，其中所述装置被配置为（i）控制或重定向转子的放电，或（ii）抑制转子的放电或（ iii）（i）和（ii）。