发明授权
- 专利标题： Lithographic apparatus and device manufacturing method
- 专利标题（中）： 平版印刷设备和器件制造方法
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申请号： US11785906申请日： 2007-04-20
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公开(公告)号： US07872731B2公开(公告)日： 2011-01-18
- 发明人: Michel Fransois Hubert Klaassen , Hendrikus Robertus Marie Van Greevenbroek , Heine Melle Mulder , Erik Martijn Greijdanus
- 申请人： Michel Fransois Hubert Klaassen , Hendrikus Robertus Marie Van Greevenbroek , Heine Melle Mulder , Erik Martijn Greijdanus
- 申请人地址： NL Veldhoven
- 专利权人： ASML Netherlands B.V.
- 当前专利权人： ASML Netherlands B.V.
- 当前专利权人地址： NL Veldhoven
- 代理机构： Pillsbury Winthrop Shaw Pittman LLP
- 主分类号： G03B27/42
- IPC分类号： G03B27/42
摘要：
A lithographic apparatus includes a polarization changing element including at least two wedge-shaped optically active members configured to rotate the polarization direction of at least a portion of the radiation beam with a predetermined angle with respect to the first direction and an optical propagation length adaptor associated with the wedge-shaped optically active members to adjust the predetermined angle.
公开/授权文献
- US20080259300A1 Lithographic apparatus and device manufacturing method 公开/授权日：2008-10-23
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