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US07875555B2 Method for plasma processing over wide pressure range 有权
在宽压力范围内进行等离子体处理的方法

Method for plasma processing over wide pressure range
Abstract:
A method for treating a substrate with plasma over a wide pressure range is described. The method comprises exposing the substrate to a low pressure plasma in a process chamber. Further, the method comprises exposing the substrate to a high pressure plasma in the process chamber.
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