发明授权
- 专利标题： EUV illumination system with a system for measuring fluctuations of the light source
- 专利标题（中）： EUV照明系统具有用于测量光源波动的系统
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申请号： US12098739申请日： 2008-04-07
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公开(公告)号： US07875865B2公开(公告)日： 2011-01-25
- 发明人: Axel Scholz , Markus Weiss , Manfred Maul , Philipp Bosselmann
- 申请人： Axel Scholz , Markus Weiss , Manfred Maul , Philipp Bosselmann
- 申请人地址： DE Oberkochen
- 专利权人： Carl Zeiss SMT AG
- 当前专利权人： Carl Zeiss SMT AG
- 当前专利权人地址： DE Oberkochen
- 代理机构： Fish & Richardson P.C.
- 主分类号： G03B27/42
- IPC分类号： G03B27/42
摘要：
The disclosure relates to an EUV (extreme ultraviolet) illumination system. The system can include at least one EUV light source, and an aperture stop and sensor arrangement for the measurement of intensity fluctuations and/or position changes of the EUV light source, in particular in the range of the effectively utilized wavelengths, or of one of the intermediate images of the EUV light source. The aperture stop and sensor arrangement can include an aperture stop and an EUV position sensor. The aperture stop and sensor arrangement can be arranged in such a way that the aperture stop allows a certain solid angle range of the radiation originating from the EUV light source or from one of its intermediate images to fall on the EUV position sensor.
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