公开(公告)号：US20110079737A1

公开(公告)日：2011-04-07

申请号：US12969115

申请日：2010-12-15

申请人： Axel Scholz ,  Markus Weiss ,  Manfred Maul ,  Philipp Bosselmann

发明人： Axel Scholz ,  Markus Weiss ,  Manfred Maul ,  Philipp Bosselmann

IPC分类号： G01J3/10

CPC分类号： G01J1/42 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70141 ,  G03F7/70558 ,  H05G2/00

摘要： The disclosure relates to an EUV (extreme ultraviolet) illumination system. The system can include at least one EUV light source, and an aperture stop and sensor arrangement for the measurement of intensity fluctuations and/or position changes of the EUV light source, in particular in the range of the effectively utilized wavelengths, or of one of the intermediate images of the EUV light source. The aperture stop and sensor arrangement can include an aperture stop and an EUV position sensor. The aperture stop and sensor arrangement can be arranged in such a way that the aperture stop allows a certain solid angle range of the radiation originating from the EUV light source or from one of its intermediate images to fall on the EUV position sensor.

摘要翻译： 本公开涉及EUV（极紫外）照明系统。 该系统可以包括至少一个EUV光源，以及用于测量EUV光源的强度波动和/或位置变化的孔径光阑和传感器装置，特别是在有效使用的波长的范围内，或者 EUV光源的中间图像。 孔径光阑和传感器装置可以包括孔径光阑和EUV位置传感器。 孔径光阑和传感器装置可以以这样的方式布置，使得孔径光阑允许源自EUV光源或其中间图像之一的辐射的特定立体角范围落在EUV位置传感器上。

公开(公告)号：US07473907B2

公开(公告)日：2009-01-06

申请号：US11091238

申请日：2005-03-28

申请人： Wolfgang Singer ,  Martin Antoni ,  Johannes Wangler ,  Markus Weiss ,  Vadim Yevgenyevich Banine ,  Marcel Dierichs ,  Roel Moors ,  Karl Heinz Schuster ,  Axel Scholz ,  Philipp Bosselmann ,  Bernd Warm

发明人： Wolfgang Singer ,  Martin Antoni ,  Johannes Wangler ,  Markus Weiss ,  Vadim Yevgenyevich Banine ,  Marcel Dierichs ,  Roel Moors ,  Karl Heinz Schuster ,  Axel Scholz ,  Philipp Bosselmann ,  Bernd Warm

IPC分类号： G01G1/00 ,  G01J1/42

CPC分类号： G03F7/7085 ,  G03F7/70141 ,  G03F7/70558

摘要： There is provided an illumination system that includes (a) a light source that emits light having a wavelength ≦193 nm, where the light provides a predetermined illumination in a plane distant from the light source and defines a used area in the plane, and (b) a sensor, situated in or near the plane, for detecting light outside the used area.

摘要翻译： 提供了一种照明系统，其包括（a）发射波长<= 193nm的光的光源，其中所述光在远离光源的平面中提供预定照明并且在平面中限定使用区域，以及 （b）位于或靠近平面的传感器，用于检测使用区域外的光。

公开(公告)号：US08513628B2

公开(公告)日：2013-08-20

申请号：US12969115

申请日：2010-12-15

申请人： Axel Scholz ,  Markus Weiss ,  Manfred Maul ,  Philipp Bosselmann

发明人： Axel Scholz ,  Markus Weiss ,  Manfred Maul ,  Philipp Bosselmann

IPC分类号： G01J1/42

CPC分类号： G01J1/42 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70141 ,  G03F7/70558 ,  H05G2/00

摘要： The disclosure relates to an EUV (extreme ultraviolet) illumination system. The system can include at least one EUV light source, and an aperture stop and sensor arrangement for the measurement of intensity fluctuations and/or position changes of the EUV light source, in particular in the range of the effectively utilized wavelengths, or of one of the intermediate images of the EUV light source. The aperture stop and sensor arrangement can include an aperture stop and an EUV position sensor. The aperture stop and sensor arrangement can be arranged in such a way that the aperture stop allows a certain solid angle range of the radiation originating from the EUV light source or from one of its intermediate images to fall on the EUV position sensor.

摘要翻译： 本公开涉及EUV（极紫外）照明系统。 该系统可以包括至少一个EUV光源，以及用于测量EUV光源的强度波动和/或位置变化的孔径光阑和传感器装置，特别是在有效使用的波长的范围内，或者 EUV光源的中间图像。 孔径光阑和传感器装置可以包括孔径光阑和EUV位置传感器。 孔径光阑和传感器装置可以以这样的方式布置，使得孔径光阑允许源自EUV光源或其中间图像之一的辐射的特定立体角范围落在EUV位置传感器上。

公开(公告)号：US20050274897A1

公开(公告)日：2005-12-15

申请号：US11091238

申请日：2005-03-28

申请人： Wolfgang Singer ,  Martin Antoni ,  Johannes Wangler ,  Markus Weiss ,  Vadim Banine ,  Marcel Dierichs ,  Roel Moors ,  Karl Schuster ,  Axel Scholz ,  Philipp Bosselmann ,  Bernd Warm

发明人： Wolfgang Singer ,  Martin Antoni ,  Johannes Wangler ,  Markus Weiss ,  Vadim Banine ,  Marcel Dierichs ,  Roel Moors ,  Karl Schuster ,  Axel Scholz ,  Philipp Bosselmann ,  Bernd Warm

IPC分类号： G03F7/20 ,  G01J1/42

CPC分类号： G03F7/7085 ,  G03F7/70141 ,  G03F7/70558

摘要： There is provided an illumination system that includes (a) a light source that emits light having a wavelength ≦193 nm, where the light provides a predetermined illumination in a plane distant from the light source and defines a used area in the plane, and (b) a sensor, situated in or near the plane, for detecting light outside the used area.

摘要翻译： 提供了一种照明系统，其包括（a）发射波长<= 193nm的光的光源，其中所述光在远离光源的平面中提供预定照明并且在平面中限定使用区域，以及 （b）位于或靠近平面的传感器，用于检测使用区域外的光。

公开(公告)号：US07875865B2

公开(公告)日：2011-01-25

申请号：US12098739

申请日：2008-04-07

申请人： Axel Scholz ,  Markus Weiss ,  Manfred Maul ,  Philipp Bosselmann

发明人： Axel Scholz ,  Markus Weiss ,  Manfred Maul ,  Philipp Bosselmann

IPC分类号： G03B27/42

CPC分类号： G01J1/42 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70141 ,  G03F7/70558 ,  H05G2/00

摘要： The disclosure relates to an EUV (extreme ultraviolet) illumination system. The system can include at least one EUV light source, and an aperture stop and sensor arrangement for the measurement of intensity fluctuations and/or position changes of the EUV light source, in particular in the range of the effectively utilized wavelengths, or of one of the intermediate images of the EUV light source. The aperture stop and sensor arrangement can include an aperture stop and an EUV position sensor. The aperture stop and sensor arrangement can be arranged in such a way that the aperture stop allows a certain solid angle range of the radiation originating from the EUV light source or from one of its intermediate images to fall on the EUV position sensor.

摘要翻译： 本公开涉及EUV（极紫外）照明系统。 该系统可以包括至少一个EUV光源，以及用于测量EUV光源的强度波动和/或位置变化的孔径光阑和传感器装置，特别是在有效使用的波长的范围内，或者 EUV光源的中间图像。 孔径光阑和传感器装置可以包括孔径光阑和EUV位置传感器。 孔径光阑和传感器装置可以以这样的方式布置，使得孔径光阑允许源自EUV光源或其中间图像之一的辐射的特定立体角范围落在EUV位置传感器上。

公开(公告)号：US20080258070A1

公开(公告)日：2008-10-23

申请号：US12098739

申请日：2008-04-07

申请人： Axel Scholz ,  Markus Weiss ,  Manfred Maul ,  Philipp Bosselmann

发明人： Axel Scholz ,  Markus Weiss ,  Manfred Maul ,  Philipp Bosselmann

IPC分类号： G01J1/42

CPC分类号： G01J1/42 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70141 ,  G03F7/70558 ,  H05G2/00

摘要： The disclosure relates to an EUV (extreme ultraviolet) illumination system. The system can include at least one EUV light source, and an aperture stop and sensor arrangement for the measurement of intensity fluctuations and/or position changes of the EUV light source, in particular in the range of the effectively utilized wavelengths, or of one of the intermediate images of the EUV light source. The aperture stop and sensor arrangement can include an aperture stop and an EUV position sensor. The aperture stop and sensor arrangement can be arranged in such a way that the aperture stop allows a certain solid angle range of the radiation originating from the EUV light source or from one of its intermediate images to fall on the EUV position sensor.

摘要翻译： 本公开涉及EUV（极紫外）照明系统。 该系统可以包括至少一个EUV光源，以及用于测量EUV光源的强度波动和/或位置变化的孔径光阑和传感器装置，特别是在有效使用的波长的范围内，或者 EUV光源的中间图像。 孔径光阑和传感器装置可以包括孔径光阑和EUV位置传感器。 孔径光阑和传感器装置可以以这样的方式布置，使得孔径光阑允许源自EUV光源或其中间图像之一的辐射的特定立体角范围落在EUV位置传感器上。