发明授权
- 专利标题: Charged particle beam irradiation system
- 专利标题(中): 带电粒子束照射系统
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申请号: US12336592申请日: 2008-12-17
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公开(公告)号: US07875868B2公开(公告)日: 2011-01-25
- 发明人: Kunio Moriyama , Takahide Nakayama , Hideaki Nishiuchi
- 申请人: Kunio Moriyama , Takahide Nakayama , Hideaki Nishiuchi
- 申请人地址: JP Tokyo
- 专利权人: Hitachi, Ltd.
- 当前专利权人: Hitachi, Ltd.
- 当前专利权人地址: JP Tokyo
- 代理机构: Antonelli, Terry, Stout & Kraus, LLP.
- 优先权: JP2007-330297 20071221
- 主分类号: A61N5/00
- IPC分类号: A61N5/00
摘要:
A charged particle beam irradiation system comprises a high-speed steerer (beam dump device) 100 disposed in a course of a beam transport line 4 through which an ion beam is extracted from a charged-particle beam generator 1. The beam dump device 100 is provided with dose monitoring devices 105, 106 for measuring a dose of an ion beam applied to a beam dump 104 so that the intensity of the ion beam can be measured without transporting the ion beam to irradiation nozzles 15A through 15D. Thus, the system is capable of adjusting the intensity of an ion beam extracted from a synchrotron without operating each component of a beam transport line, and an irradiation nozzle.
公开/授权文献
- US20090184263A1 Charged Particle Beam Irradiation System 公开/授权日:2009-07-23
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