发明授权
- 专利标题： Optical element and projection exposure apparatus based on use of the optical element
- 专利标题（中）： 基于使用光学元件的光学元件和投影曝光装置
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申请号： US11147284申请日： 2005-06-08
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公开(公告)号： US07876418B2公开(公告)日： 2011-01-25
- 发明人: Takeshi Shirai
- 申请人： Takeshi Shirai
- 申请人地址： JP Tokyo
- 专利权人： Nikon Corporation
- 当前专利权人： Nikon Corporation
- 当前专利权人地址： JP Tokyo
- 代理机构： Oliff & Berridge, PLC
- 优先权： JP2002-357641 20021210
- 主分类号： G03B27/42
- IPC分类号： G03B27/42
摘要：
A liquid immersion exposure apparatus includes a projection optical system (PL) which projects an image of a pattern onto a substrate (W) and a unit (5) which supplies a liquid (7) between an optical element (4) at the end of the projection optical system (PL) and the substrate (W). A corrosion-resistant film composed of an oxide is formed on the surface of the optical element (4) to prevent corrosion by the liquid (7). Consequently, a desired performance of the projection optical system can be secured for a long time even where a full field exposure in the step-and-repeat manner or a scanning exposure in the step-and-scan manner is performed in a liquid-immersion state.
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