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US07879626B2 Structure and manufacturing method of semiconductor memory device 有权
半导体存储器件的结构和制造方法

Structure and manufacturing method of semiconductor memory device
摘要:
A semiconductor memory device having a cross point structure includes a plurality of upper electrodes arranged to extend in one direction, and a plurality of lower electrodes arranged to extend in another direction at a right angle to the one direction of the upper electrodes. Memory materials are provided between the upper electrodes and the lower electrodes for storage of data. The memory materials are made of a perovskite material and arranged at the lower electrodes side of the corresponding upper electrode extending along the corresponding upper electrode.
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