发明授权
- 专利标题: Method for patterning polycrystalline indium tin oxide
- 专利标题(中): 图案化多晶铟锡氧化物的方法
-
申请号: US12371701申请日: 2009-02-16
-
公开(公告)号: US07879712B2公开(公告)日: 2011-02-01
- 发明人: Chung-Wei Cheng , Hwei-Shen Chen , Jenq-Shyong Chen
- 申请人: Chung-Wei Cheng , Hwei-Shen Chen , Jenq-Shyong Chen
- 申请人地址: TW Hsin-Chu
- 专利权人: Industrial Technology Research Institute
- 当前专利权人: Industrial Technology Research Institute
- 当前专利权人地址: TW Hsin-Chu
- 代理机构: WPAT, PC
- 代理商 Justin King
- 优先权: TW97140993A 20081024
- 主分类号: H01L21/00
- IPC分类号: H01L21/00
摘要:
A method for patterning polycrystalline indium tin oxide by using a Gaussian laser beam focused on an amorphous indium tin oxide layer is disclosed to pattern the non-crystalline amorphous indium tin oxide layer and transfer part of the amorphous indium tin oxide layer into polycrystalline indium tin oxide while the remaining amorphous indium tin oxide layer is etched due to etching selectivity of an etching solution. The method comprises: providing a substrate with an amorphous indium tin oxide layer thereon on a carrier; transferring the amorphous indium tin oxide layer in a predetermined area into a polycrystalline indium tin oxide layer by emitting a Gaussian laser beam focused on the amorphous indium tin oxide layer in the predetermined area; and removing the remaining amorphous indium tin oxide layer on the substrate by an etching solution to form a patterned polycrystalline indium tin oxide layer.
公开/授权文献
- US20100105196A1 METHOD FOR PATTERNING POLYCRYSTALLINE INDIUM TIN OXIDE 公开/授权日:2010-04-29
信息查询
IPC分类: