Invention Grant
- Patent Title: Photoelectric transfer material, manufacturing method thereof, photoelectric transfer element and manufacturing method thereof
- Patent Title (中): 光电转移材料及其制造方法,光电转移元件及其制造方法
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Application No.: US11033587Application Date: 2005-01-11
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Publication No.: US07884281B2Publication Date: 2011-02-08
- Inventor: Masashi Enomoto , Myung-Seok Choi , Yoshiaki Kobuke , Akiharu Satake
- Applicant: Masashi Enomoto , Myung-Seok Choi , Yoshiaki Kobuke , Akiharu Satake
- Applicant Address: JP Tokyo
- Assignee: Sony Corporation
- Current Assignee: Sony Corporation
- Current Assignee Address: JP Tokyo
- Agency: K&L Gates LLP
- Priority: JPP2004-010068 20040119
- Main IPC: H01L31/00
- IPC: H01L31/00

Abstract:
A photoelectric transfer material, manufacturing method thereof, photoelectric transfer element and manufacturing method thereof are provided. In an organic photoelectric transfer element of an organic solar cell or other like device, the photoelectric transfer material is composed of a conductive polymer such as MEH-PPV, electronic acceptor such as a fullerene derivative and antenna porphyrin aggregate. The photoelectric transfer material can be made by coating a mixed solution of the conductive polymer, electron acceptor and antenna porphyrin aggregate by spin coating, for example. This photoelectric transfer material and a photoelectric transfer element using the material exhibit high photoelectric transfer efficiency because of small electric resistance and high sunlight usage efficiency, and simultaneously exhibit stability.
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