Invention Grant
- Patent Title: Image device and method of fabricating the same
- Patent Title (中): 图像装置及其制造方法
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Application No.: US12014294Application Date: 2008-01-15
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Publication No.: US07884400B2Publication Date: 2011-02-08
- Inventor: Seung-hun Shin
- Applicant: Seung-hun Shin
- Applicant Address: KR Suwon-si, Gyeonggi-do
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Suwon-si, Gyeonggi-do
- Agency: Volentine & Whitt, P.L.L.C.
- Priority: KR10-2007-0019133 20070226
- Main IPC: H01L31/00
- IPC: H01L31/00

Abstract:
An image device and a method of fabricating the image device include a substrate pattern formed to define an opening and to include a portion of a photodiode for receiving light. Stacked metal interconnection patterns and an interlayer dielectric layer are formed beneath the substrate pattern. A height of the opening equals a height of the substrate pattern, such that an exposed portion of a top surface of the interlayer dielectric layer provides a bottom surface of the opening. An external connection electrode is positioned on the bottom surface of the opening.
Public/Granted literature
- US20080203516A1 IMAGE DEVICE AND METHOD OF FABRICATING THE SAME Public/Granted day:2008-08-28
Information query
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