Invention Grant
- Patent Title: Apparatus and method configured to lower thermal stresses
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Application No.: US11925268Application Date: 2007-10-26
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Publication No.: US07888782B2Publication Date: 2011-02-15
- Inventor: Peter Nelle , Matthias Stecher
- Applicant: Peter Nelle , Matthias Stecher
- Applicant Address: DE Neubiberg
- Assignee: Infineon Technologies AG
- Current Assignee: Infineon Technologies AG
- Current Assignee Address: DE Neubiberg
- Agency: Dicke, Billig & Czaja, PLLC
- Main IPC: H01L23/495
- IPC: H01L23/495

Abstract:
An apparatus and a method configured to lower thermal stress is disclosed. One embodiment provides a semiconductor chip, a lead frame and a layer structure. The layer structure includes at least a diffusion solder layer and a buffer layer. The layer structure is arranged between the semiconductor chip and the lead frame. The buffer layer includes a material, which is soft in comparison to a material of the diffusion solder layer, and includes a layer thickness such that thermal stresses in the semiconductor chip remain below a predetermined value during temperature fluctuations within a temperature range.
Public/Granted literature
- US20090108421A1 APPARATUS AND METHOD CONFIGURED TO LOWER THERMAL STRESSES Public/Granted day:2009-04-30
Information query
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