Invention Grant
- Patent Title: Semiconductor device using magnetic domain wall movement and method of manufacturing the same
- Patent Title (中): 使用磁畴壁运动的半导体器件及其制造方法
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Application No.: US11727689Application Date: 2007-03-28
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Publication No.: US07889533B2Publication Date: 2011-02-15
- Inventor: In-jun Hwang , Sung-chul Lee
- Applicant: In-jun Hwang , Sung-chul Lee
- Applicant Address: KR Gyeonggi-do
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Gyeonggi-do
- Agency: Harness, Dickey & Pierce
- Priority: KR10-2006-0101577 20061018
- Main IPC: G11C19/08
- IPC: G11C19/08

Abstract:
A semiconductor device using a magnetic domain wall movement and a method of manufacturing the semiconductor device are provided. The semiconductor device includes a magnetic layer that is formed on a substrate and has a plurality of magnetic domains, and a unit that supplies energy to move a magnetic domain wall in the magnetic layer. The magnetic layer is formed parallel to the substrate, and includes a plurality of prominences and a plurality of depressions alternately formed along a lengthwise direction thereof. The magnetic layer has a stepped form that secures a reliable movement of the magnetic domain wall in units of one bit.
Public/Granted literature
- US20080094887A1 Semiconductor device using magnetic domain wall movement and method of manufacturing the same Public/Granted day:2008-04-24
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