发明授权
- 专利标题: Image processing unit for wafer inspection tool
- 专利标题(中): 晶圆检测工具图像处理单元
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申请号: US12170532申请日: 2008-07-10
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公开(公告)号: US07889911B2公开(公告)日: 2011-02-15
- 发明人: Michio Nakano , Shigeya Tanaka , Yoshiyuki Momiyama , Takashi Hiroi , Kazuya Hayashi , Dai Fujii , Takako Fujisawa , Atsushi Ichige , Ichiro Kawashima
- 申请人: Michio Nakano , Shigeya Tanaka , Yoshiyuki Momiyama , Takashi Hiroi , Kazuya Hayashi , Dai Fujii , Takako Fujisawa , Atsushi Ichige , Ichiro Kawashima
- 申请人地址: JP Tokyo
- 专利权人: Hitachi High-Technologies Corporation
- 当前专利权人: Hitachi High-Technologies Corporation
- 当前专利权人地址: JP Tokyo
- 代理机构: Dickstein Shapiro LLP
- 优先权: JP2003-052239 20030228
- 主分类号: G06K9/00
- IPC分类号: G06K9/00
摘要:
An image processing apparatus for wafer inspection tool that is able to perform continuously cell to cell comparison inspection, die to die comparison inspection, and cell-to-cell and die-to-die hybrid comparison inspection, employing a plurality of processors. This image processing apparatus for wafer inspection tool comprises a plurality of processors for performing parallel processing, means for cutting out image data including a forward end overlap and a rear end overlap at partition boundaries in order to cut serial data into a predetermined image size, means for distributing the cutout image data to the plurality of processors, and means for assembling results of processing performed by the plurality of processors. The forward end overlap is set greater than a pitch of the cell subject to cell to cell comparison inspection.
公开/授权文献
- US20080285841A1 IMAGE PROCESSING UNIT FOR WAFER INSPECTION TOOL 公开/授权日:2008-11-20
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