发明授权
US07893442B2 Schottky diode having low breakdown voltage and method for fabricating the same
有权
具有低击穿电压的肖特基二极管及其制造方法
- 专利标题: Schottky diode having low breakdown voltage and method for fabricating the same
- 专利标题(中): 具有低击穿电压的肖特基二极管及其制造方法
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申请号: US11702489申请日: 2007-02-06
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公开(公告)号: US07893442B2公开(公告)日: 2011-02-22
- 发明人: Dong-sik Shim , Hyung Choi , Young-hoon Min
- 申请人: Dong-sik Shim , Hyung Choi , Young-hoon Min
- 申请人地址: KR Suwon-si
- 专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人地址: KR Suwon-si
- 代理机构: Sughrue Mion, PLLC
- 优先权: KR10-2006-0049293 20060601
- 主分类号: H01L29/15
- IPC分类号: H01L29/15 ; H01L29/66 ; H01L21/44 ; H01L21/28
摘要:
Provided are a schottky diode having an appropriate low breakdown voltage to be used in a radio frequency identification (RFID) tag and a method for fabricating the same. The schottky diode includes a silicon substrate having a structure in which an N-type well is formed on a P-type substrate, an insulating layer surrounding a circumference of the N-type well so as to electrically separate the N-type well from the P-type substrate, an N+ doping layer partly formed in a portion of a region of an upper surface of the N-type well, an N− doping layer partly formed in the other portion of a region of the upper surface of the N-type well, a cathode formed on the N+ doping layer, and an anode formed on the N− doping layer.
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