发明授权
- 专利标题: Method for manufacturing magnetoresistance effect element
- 专利标题(中): 制造磁阻效应元件的方法
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申请号: US11703830申请日: 2007-02-08
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公开(公告)号: US07897201B2公开(公告)日: 2011-03-01
- 发明人: Hiromi Yuasa , Hideaki Fukuzawa , Yoshihiko Fuji , Hitoshi Iwasaki
- 申请人: Hiromi Yuasa , Hideaki Fukuzawa , Yoshihiko Fuji , Hitoshi Iwasaki
- 申请人地址: JP Tokyo
- 专利权人: Kabushiki Kaisha Toshiba
- 当前专利权人: Kabushiki Kaisha Toshiba
- 当前专利权人地址: JP Tokyo
- 代理机构: Nixon & Vanderhye, PC
- 优先权: JPP2006-032261 20060209
- 主分类号: G11B21/00
- IPC分类号: G11B21/00 ; B05D3/00 ; H05H1/00 ; C23F3/00
摘要:
A method is for manufacturing a magnetoresistance effect element having a magnetization fixed layer, a non-magnetic intermediate layer, and a magnetization free layer being sequentially stacked. The method includes: forming at least a part of a magnetic layer that is to become either one of the magnetization fixed layer and the magnetization free layer; forming a function layer including at least one of an oxide, a nitride, and a fluoride on the part of the magnetic layer; and removing a part of the function layer by exposing the function layer to either one of an ion beam and plasma irradiation.
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