发明授权
- 专利标题: Drop analysis system
- 专利标题(中): 跌落分析系统
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申请号: US11912209申请日: 2006-04-25
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公开(公告)号: US07901026B2公开(公告)日: 2011-03-08
- 发明人: David Albertalli , Robert G. Boehm, Jr. , Oleg N. Gratchev , James N Middleton , Perry West
- 申请人: David Albertalli , Robert G. Boehm, Jr. , Oleg N. Gratchev , James N Middleton , Perry West
- 申请人地址: JP Kanagawa
- 专利权人: ULVAC, Inc.
- 当前专利权人: ULVAC, Inc.
- 当前专利权人地址: JP Kanagawa
- 代理机构: Harness, Dickey & Pierce, PLC
- 国际申请: PCT/US2006/015607 WO 20060425
- 国际公布: WO2006/137971 WO 20061228
- 主分类号: B41J29/393
- IPC分类号: B41J29/393
摘要:
A drop analysis/drop check system allows a plurality of printheads to remain stationary during analysis to emulate operation of an actual piezoelectric microdeposition system. The system provides accurate tuning of individual nozzle ejectors and allows for substrate loading and alignment in parallel with drop analysis/drop check. The drop analysis/drop check system includes a motion controller directing movement of a stage, a printhead controller controlling a printhead to selectively eject drops of fluid material to be deposited on a substrate, and a camera supported by the stage for movement relative to the printheads. The camera receives a signal from the motion controller to initiate exposure of the camera and captures an image of the drops of fluid material ejected by the printheads. A light-emitting device includes a strobe controller that receives a signal from the camera to supply light to an area including the liquid drops during camera exposure.
公开/授权文献
- US20080151270A1 Drop Analysis System 公开/授权日:2008-06-26
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