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    INKJET PRINTHEAD MODULE WITH ADJUSTABLE ALIGNMENT
    3.
    发明申请
    INKJET PRINTHEAD MODULE WITH ADJUSTABLE ALIGNMENT 审中-公开
    具有可调整对准的INKJET PRINTHEAD模块

    公开(公告)号：US20110149000A1

    公开(公告)日：2011-06-23

    申请号：US12975922

    申请日：2010-12-22

    Applicant: David ALBERTALLI ,  James N. MIDDLETON ,  Roy M. Patterson

    Inventor： David ALBERTALLI ,  James N. MIDDLETON ,  Roy M. Patterson

    IPC: B41J2/18 ,  B05B1/02 ,  B05B15/08 ,  B05B15/10 ,  B05C13/00

    CPC classification number: B41J25/001

    Abstract: A microdeposition system includes a stage, a printhead carriage, and a controller. The stage holds a substrate. The printhead carriage includes N printhead modules, where N is an integer greater than one. Each of the N printhead modules includes a printhead and an alignment mechanism. The printhead includes a plurality of nozzles that deposit droplets of fluid manufacturing material onto the substrate while relative movement between the substrate and the printhead is along a first axis. The alignment mechanism adjusts the printhead with respect to the printhead module. The controller controls the alignment mechanisms of the N printhead modules to set effective nozzle spacing for the pluralities of nozzles to a uniform value. The effective nozzle spacing is defined as spacing between adjacent ones of the plurality of nozzles as projected onto a second axis perpendicular to the first axis.

    Abstract translation: 微沉积系统包括载物台，打印头滑架和控制器。 舞台上有一个衬底。 打印头托架包括N个打印头模块，其中N是大于1的整数。 N个打印头模块中的每一个包括打印头和对准机构。 打印头包括多个喷嘴，其将液体制造材料的液滴沉积到基板上，同时基板和打印头之间的相对运动沿着第一轴线。 对准机构相对于打印头模块调节打印头。 控制器控制N个打印头模块的对准机构，以将多个喷嘴的有效喷嘴间距设置为均匀的值。 有效喷嘴间距被定义为当投影到垂直于第一轴线的第二轴线上时，多个喷嘴中的相邻喷嘴之间的间隔。

    Drop Analysis System
    4.
    发明申请
    Drop Analysis System 有权
    跌落分析系统

    公开(公告)号：US20080151270A1

    公开(公告)日：2008-06-26

    申请号：US11912209

    申请日：2006-04-25

    Applicant: David Albertalli ,  Robert G. Boehm Jr ,  Oleg N. Gratchev ,  James N. Middleton ,  Perry West

    Inventor： David Albertalli ,  Robert G. Boehm Jr ,  Oleg N. Gratchev ,  James N. Middleton ,  Perry West

    IPC: G01B11/22

    CPC classification number: B41J2/04581 ,  B41J2/04561 ,  B41J3/28 ,  B41J11/42

    Abstract: A drop analysis/drop check system allows a plurality of printheads to remain stationary during analysis to emulate operation of an actual piezoelectric microdeposition system. The system provides accurate tuning of individual nozzle ejectors and allows for substrate loading and alignment in parallel with drop analysis/drop check. The drop analysis/drop check system includes a motion controller directing movement of a stage, a printhead controller controlling a printhead to selectively eject drops of fluid material to be deposited on a substrate, and a camera supported by the stage for movement relative to the printheads. The camera receives a signal from the motion controller to initiate exposure of the camera and captures an image of the drops of fluid material ejected by the printheads. A light-emitting device includes a strobe controller that receives a signal from the camera to supply light to an area including the liquid drops during camera exposure.

    Abstract translation: 液滴分析/滴落检查系统允许多个打印头在分析期间保持静止以模拟实际的压电微沉积系统的操作。 该系统提供单个喷嘴喷射器的精确调谐，并允许基底装载和对准与滴液分析/滴落检查并行。 液滴分析/滴落检查系统包括引导台的运动的运动控制器，控制打印头的打印头控制器以选择性地喷射要沉积在基板上的流体材料的液滴，以及由台架相对于相对于打印头移动的相机 。 照相机接收来自运动控制器的信号以开始照相机的曝光并且捕获由打印头喷射的液体材料滴的图像。 发光装置包括选通控制器，其接收来自照相机的信号，以在照相机曝光期间向包括液滴的区域提供光。

    Drop analysis system
    5.
    发明授权
    Drop analysis system 有权
    跌落分析系统

    公开(公告)号：US07901026B2

    公开(公告)日：2011-03-08

    申请号：US11912209

    申请日：2006-04-25

    Applicant: David Albertalli ,  Robert G. Boehm, Jr. ,  Oleg N. Gratchev ,  James N Middleton ,  Perry West

    Inventor： David Albertalli ,  Robert G. Boehm, Jr. ,  Oleg N. Gratchev ,  James N Middleton ,  Perry West

    IPC: B41J29/393

    CPC classification number: B41J2/04581 ,  B41J2/04561 ,  B41J3/28 ,  B41J11/42

    Abstract: A drop analysis/drop check system allows a plurality of printheads to remain stationary during analysis to emulate operation of an actual piezoelectric microdeposition system. The system provides accurate tuning of individual nozzle ejectors and allows for substrate loading and alignment in parallel with drop analysis/drop check. The drop analysis/drop check system includes a motion controller directing movement of a stage, a printhead controller controlling a printhead to selectively eject drops of fluid material to be deposited on a substrate, and a camera supported by the stage for movement relative to the printheads. The camera receives a signal from the motion controller to initiate exposure of the camera and captures an image of the drops of fluid material ejected by the printheads. A light-emitting device includes a strobe controller that receives a signal from the camera to supply light to an area including the liquid drops during camera exposure.

    Abstract translation: 液滴分析/滴落检查系统允许多个打印头在分析期间保持静止以模拟实际的压电微沉积系统的操作。 该系统提供单个喷嘴喷射器的精确调谐，并允许基底装载和对准与滴液分析/滴落检查并行。 液滴分析/滴落检查系统包括引导台的运动的运动控制器，控制打印头的打印头控制器以选择性地喷射要沉积在基板上的流体材料的液滴，以及由台架相对于相对于打印头移动的相机 。 照相机接收来自运动控制器的信号以开始照相机的曝光并且捕获由打印头喷射的液体材料滴的图像。 发光装置包括选通控制器，其接收来自照相机的信号，以在照相机曝光期间向包括液滴的区域提供光。

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