发明授权
- 专利标题: Lithographic apparatus and device manufacturing method
- 专利标题(中): 平版印刷设备和器件制造方法
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申请号: US11402258申请日: 2006-04-12
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公开(公告)号: US07903232B2公开(公告)日: 2011-03-08
- 发明人: Martinus Hendrikus Antonius Leenders , Michel Riepen , Martin Anton Bos
- 申请人: Martinus Hendrikus Antonius Leenders , Michel Riepen , Martin Anton Bos
- 申请人地址: NL Veldhoven
- 专利权人: ASML Netherlands B.V.
- 当前专利权人: ASML Netherlands B.V.
- 当前专利权人地址: NL Veldhoven
- 代理机构: Pillsbury Winthrop Shaw Pittman LLP
- 主分类号: G03B27/52
- IPC分类号: G03B27/52 ; G03B27/42
摘要:
An immersion lithographic exposure apparatus in which the pH of the top coat of the immersion liquid is chosen so as to maximize the relative speed at which a part of the liquid supply system and the substrate W can be moved relative to each other without collapse of a meniscus extending between those components.
公开/授权文献
- US20070243697A1 Lithographic apparatus and device manufacturing method 公开/授权日:2007-10-18
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