发明授权
- 专利标题: Apparatus and method for inspecting pattern
- 专利标题(中): 用于检查图案的装置和方法
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申请号: US12263682申请日: 2008-11-03
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公开(公告)号: US07911601B2公开(公告)日: 2011-03-22
- 发明人: Sachio Uto , Minoru Yoshida , Toshihiko Nakata , Shunzi Maeda , Atsushi Shimoda
- 申请人: Sachio Uto , Minoru Yoshida , Toshihiko Nakata , Shunzi Maeda , Atsushi Shimoda
- 申请人地址: JP Tokyo
- 专利权人: Hitachi, Ltd.
- 当前专利权人: Hitachi, Ltd.
- 当前专利权人地址: JP Tokyo
- 代理机构: Antonelli, Terry, Stout & Kraus, LLP.
- 优先权: JP2001-228166 20010727
- 主分类号: G01N21/00
- IPC分类号: G01N21/00
摘要:
A method and apparatus for inspecting defects includes emitting an ultraviolet light from an ultraviolet light source, illuminating a specimen with the ultraviolet light in which a polarization condition of the ultraviolet light is controlled, controlling a polarization condition of light reflected from the specimen which is illuminated by the polarization condition controlled ultraviolet light, detecting the light reflected from the specimen, processing the detected light so as to detect defects, and outputting information about the defects. The ultraviolet light source is disposed in a clean environment supplied with clean gas and separated from outside.
公开/授权文献
- US20090066943A1 Apparatus And Method For Inspecting Pattern 公开/授权日:2009-03-12
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