发明授权
- 专利标题： Processing solution supply system, processing solution supply method and recording medium for storing processing solution supply control program
- 专利标题（中）： 处理液供应系统，处理液供应方式和存储处理液供应控制程序的记录介质
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申请号： US11798597申请日： 2007-05-15
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公开(公告)号： US07918242B2公开(公告)日： 2011-04-05
- 发明人: Junya Minamida , Takahiro Okubo
- 申请人： Junya Minamida , Takahiro Okubo
- 申请人地址： JP Tokyo
- 专利权人： Tokyo Electron Limited
- 当前专利权人： Tokyo Electron Limited
- 当前专利权人地址： JP Tokyo
- 代理机构： Smith, Gambrell & Russell, LLP
- 优先权： JP2006-139910 20060519
- 主分类号： F04F1/10
- IPC分类号： F04F1/10
摘要：
A processing solution pressurized at a constant pressure is supplied to improve processing accuracy. A controller receives a pressure signal indicating a measured pressure exerted on a processing solution from a pressure sensor, and controls an electropneumatic regulator on the basis of the pressure signal so that pressure on the discharge side of the electropneumatic regulator is constant. The controller decides whether the processing solution contained in a processing solution tank has been depleted on the basis of a difference between a desired pressure and the pressure measured by the pressure sensor, and switches pressurizing shut-off valves accordingly.
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