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US07919400B2 Methods for doping nanostructured materials and nanostructured thin films 有权
掺杂纳米结构材料和纳米结构薄膜的方法

Methods for doping nanostructured materials and nanostructured thin films
摘要：
A method for introducing one or more impurities into nano-structured materials. The method includes providing a nanostructured material having a feature size of about 100 nm and less. The method includes subjecting a surface region of the nanostructured material to one or more impurities to form a first region having a first impurity concentration within a vicinity of the surface region. In a specific embodiment, the method includes applying a driving force to one or more portions of at least the nanostructured material to cause the first region to form a second region having a second impurity concentration.
摘要（中）：

将一种或多种杂质引入纳米结构材料的方法。 该方法包括提供具有约100nm或更小的特征尺寸的纳米结构材料。 该方法包括使纳米结构材料的表面区域经受一种或多种杂质以形成在表面区域附近具有第一杂质浓度的第一区域。 在具体实施例中，该方法包括向至少纳米结构材料的一个或多个部分施加驱动力，以使第一区域形成具有第二杂质浓度的第二区域。

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