发明授权
- 专利标题: Semiconductor device and manufacturing method thereof
- 专利标题(中): 半导体装置及其制造方法
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申请号: US11791502申请日: 2005-12-08
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公开(公告)号: US07919772B2公开(公告)日: 2011-04-05
- 发明人: Shinobu Furukawa , Ryota Imahayashi
- 申请人: Shinobu Furukawa , Ryota Imahayashi
- 申请人地址: JP
- 专利权人: Semiconductor Energy laboratory Co., Ltd.
- 当前专利权人: Semiconductor Energy laboratory Co., Ltd.
- 当前专利权人地址: JP
- 代理机构: Husch Blackwell LLP
- 优先权: JP2004-361999 20041214
- 国际申请: PCT/JP2005/022989 WO 20051208
- 国际公布: WO2006/064859 WO 20060622
- 主分类号: H01L29/08
- IPC分类号: H01L29/08
摘要:
A nonvolatile memory has a problem in that applied voltage is high. This is because a carrier needs to be injected into a floating gate through an insulating film by a tunneling effect. In addition, there is concern about deterioration of the insulating film by performing such carrier injection. An object of the present invention is to provide a memory in which applied voltage is lowered and deterioration of an insulating film is prevented. One feature is to use a layer in which an inorganic compound having a charge-transfer complex is mixed with an organic compound as a layer functioning as a floating gate of a memory. A specific example is an element having a transistor structure where a layer in which an inorganic compound having a charge-transfer complex is mixed with an organic compound and which is sandwiched between insulating layers is used as a floating gate.
公开/授权文献
- US20080042128A1 Semiconductor Device and Manufacturing Method Thereof 公开/授权日:2008-02-21
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