Invention Grant
- Patent Title: Photolithographic patterning of polymeric materials
- Patent Title (中): 聚合材料的光刻图案化
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Application No.: US11355668Application Date: 2006-02-15
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Publication No.: US07923071B2Publication Date: 2011-04-12
- Inventor: Robert Charters , Dax Kukulj
- Applicant: Robert Charters , Dax Kukulj
- Applicant Address: AU Acton, Act
- Assignee: RPO Pty Limited
- Current Assignee: RPO Pty Limited
- Current Assignee Address: AU Acton, Act
- Agency: Miller, Matthias & Hull, LLP
- Main IPC: B05D3/00
- IPC: B05D3/00 ; B05D3/06 ; B05D3/10 ; B32B27/00 ; B32B27/36

Abstract:
The invention comprises methods for the photolithographic patterning of features in a photo-curable polymer composition coated onto a plastic substrate. In one embodiment of this invention, the plastic substrate is coated with a reflective film such as a metallic barrier. In another embodiment, the plastic substrate is coated or co-extruded with a polymer barrier layer containing an additive that absorbs the photo-curing radiation. In yet another embodiment the plastic substrate contains an intrinsic additive that absorbs the photo-curing radiation. Combinations of these embodiments are also within the scope of this invention.The methods of the present invention may be advantageously applied to the fabrication of optical waveguides comprising a photo-curable polymer supported on a plastic substrate, but are applicable to the fabrication of any device or object comprising a photo-curable polymer supported on a plastic substrate.
Public/Granted literature
- US20070190331A1 Photolithographic patterning of polymeric materials Public/Granted day:2007-08-16
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