Invention Grant
- Patent Title: Method of measuring length of measurement object article in micro-structure
- Patent Title (中): 微观结构测量物品长度测量方法
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Application No.: US11346826Application Date: 2006-02-03
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Publication No.: US07923267B2Publication Date: 2011-04-12
- Inventor: Masanao Munekane , Junichi Tashiro
- Applicant: Masanao Munekane , Junichi Tashiro
- Applicant Address: JP
- Assignee: SII Nanotechnology Inc.
- Current Assignee: SII Nanotechnology Inc.
- Current Assignee Address: JP
- Agency: Adams & Wilks
- Priority: JP2005-034730 20050210
- Main IPC: G01R31/26
- IPC: G01R31/26
Abstract:
A substrate comprises a substrate main body having a surface on which a measurement object article is to be formed. A reference scale is disposed on the surface of the substrate main body in the vicinity of a region of the surface where the measurement object article is to be formed. The reference scale has adjacent graduations spaced-apart a preselected distance from one another.
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