Invention Grant
US07923276B2 Processes for forming electronic devices including spaced-apart radiation regions
有权
用于形成包括间隔开的辐射区域的电子器件的工艺
- Patent Title: Processes for forming electronic devices including spaced-apart radiation regions
- Patent Title (中): 用于形成包括间隔开的辐射区域的电子器件的工艺
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Application No.: US12846979Application Date: 2010-07-30
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Publication No.: US07923276B2Publication Date: 2011-04-12
- Inventor: Charles Douglas MacPherson , Gordana Srdanov , Gang Yu
- Applicant: Charles Douglas MacPherson , Gordana Srdanov , Gang Yu
- Applicant Address: US DE Wilmington US DE Wilmington
- Assignee: E. I. du Pont de Nemours and Company,Company Dupont Displays Inc
- Current Assignee: E. I. du Pont de Nemours and Company,Company Dupont Displays Inc
- Current Assignee Address: US DE Wilmington US DE Wilmington
- Agent John H. Lamming
- Main IPC: H01L21/00
- IPC: H01L21/00
Abstract:
Processes for forming an electronic device include forming a first radiation region, a second radiation region spaced apart from the first radiation region, and an insulating region. The insulating region can have a first side and a second side opposite the first side. The first radiation region can lie immediately adjacent to the first side, and the second radiation region can lie immediately adjacent to the second side. Within the insulating region, no other radiation region may lie between the first and second radiation regions, and the insulating region can include an insulating layer that includes a plurality of openings. A process for forming the electronic device can include patterning an insulating layer.
Public/Granted literature
- US20100291721A1 PROCESSES FOR FORMING ELECTRONIC DEVICES INCLUDING SPACED-APART RADIATION REGIONS Public/Granted day:2010-11-18
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