发明授权
- 专利标题: Temperature measuring device and method for measuring wafer-type thermometers
- 专利标题(中): 温度测量装置及测量晶圆型温度计的方法
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申请号: US11645616申请日: 2006-12-27
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公开(公告)号: US07923665B2公开(公告)日: 2011-04-12
- 发明人: Toshiyuki Matsumoto , Tomohide Minami
- 申请人: Toshiyuki Matsumoto , Tomohide Minami
- 申请人地址: JP
- 专利权人: Tokyo Electron Limited
- 当前专利权人: Tokyo Electron Limited
- 当前专利权人地址: JP
- 代理机构: Finnegan, Henderson Farabow, Garrett & Dunner, LLP
- 优先权: JP2005-376948 20051228
- 主分类号: H05B1/02
- IPC分类号: H05B1/02
摘要:
An object of the present invention is to provide a wafer-type thermometer capable of adapting itself to automation and improving the heat resistance to measure temperature distribution of a wafer and a method for manufacturing the wafer-type thermometer. A plurality of temperature sensors are arranged in regions formed by segmenting the upper surface of a wafer into a plurality of regions. Output signals from the plurality of temperature sensors are converted into temperature data by a conversion processing circuit where further processes the temperature data. The conversion processing circuit is housed in a storage room surrounded by a heat insulating member made of a nanocrystalline silicon layer.
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