发明授权
US07928447B2 GaN crystal substrate, fabricating method of GaN crystal substrate, and light-emitting device
有权
GaN晶体衬底,GaN晶体衬底的制造方法和发光器件
- 专利标题: GaN crystal substrate, fabricating method of GaN crystal substrate, and light-emitting device
- 专利标题(中): GaN晶体衬底,GaN晶体衬底的制造方法和发光器件
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申请号: US11487321申请日: 2006-07-17
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公开(公告)号: US07928447B2公开(公告)日: 2011-04-19
- 发明人: Toru Matsuoka , Kensaku Motoki
- 申请人: Toru Matsuoka , Kensaku Motoki
- 申请人地址: JP Osaka
- 专利权人: Sumitomo Electric Industries, Ltd.
- 当前专利权人: Sumitomo Electric Industries, Ltd.
- 当前专利权人地址: JP Osaka
- 代理机构: McDermott Will & Emery LLP
- 主分类号: H01L27/15
- IPC分类号: H01L27/15
摘要:
A GaN crystal substrate is provided, which has a diameter of not less than 20 mm and a thickness of not less than 70 μm and not more than 450 μm, and has a light absorption coefficient of not less than 7 cm−1 and not more than 68 cm−1 for light in the wavelength range of not less than 375 nm and not more than 500 nm. A fabricating method of the GaN crystal substrate, and a light-emitting device fabricated using the GaN crystal substrate are also provided.
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