Invention Grant
- Patent Title: Device for alternately contacting two wafers
- Patent Title (中): 用于交替接触两个晶片的装置
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Application No.: US10581819Application Date: 2004-12-02
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Publication No.: US07932611B2Publication Date: 2011-04-26
- Inventor: Elke Zakel , Ghassem Azdasht
- Applicant: Elke Zakel , Ghassem Azdasht
- Applicant Address: DE Nauen
- Assignee: Pac Tech—Packaging Technologies GmbH
- Current Assignee: Pac Tech—Packaging Technologies GmbH
- Current Assignee Address: DE Nauen
- Agency: Blakely, Sokoloff, Taylor & Zafman LLP.
- Priority: DE10357027 20031203; DE10361521 20031223
- International Application: PCT/DE2004/002648 WO 20041202
- International Announcement: WO2005/055288 WO 20050616
- Main IPC: H01L23/48
- IPC: H01L23/48

Abstract:
A method and device for alternately contacting two wafer-like component composite arrangements, in which the two component composite arrangements, provided with contact metallizations on their opposing contact surfaces, are brought into a coverage position with their contact metallizations to form contact pairs, in which position the contact metallizations to be joined together are pressed against one another, the contact metallizations being contacted by exposing the rear of one of the component composite arrangements to laser radiation, the wavelength of the laser radiation being selected as a function of the degree of absorption of the component composite arrangement , so that a transmission of the laser radiation through the component composite arrangement exposed to the laser radiation at the rear is essentially suppressed or an absorption of the laser radiation takes place essentially in the contact metallizations of one or both component composite arrangements.
Public/Granted literature
- US20070272991A1 Method And Device For Alternately Contacting Two Wafers Public/Granted day:2007-11-29
Information query
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