Method and device for mutual contacting of two wafers
    1.
    发明授权
    Method and device for mutual contacting of two wafers 有权
    两片晶片相互接触的方法和装置

    公开(公告)号:US07882997B2

    公开(公告)日:2011-02-08

    申请号:US11572105

    申请日:2005-07-11

    IPC分类号: B23K37/04

    摘要: A method and a device for the mutual contacting of two wafer-type component composite configurations made of multiple identical components which are implemented coherently, in particular a semiconductor wafer (12) with a functional component wafer (14), to produce electronic assemblies on the wafer level, in which the component composite configurations are each situated on a receptacle unit (11; 13) and the contact pressure necessary for the contacting between contact metallizations of the component composite configurations to be connected to one another is generated in such a way that a vacuum is generated in a contact chamber which receives the component composite configurations and is delimited by the receptacle units, and the contacting of the contact metallizations is performed by a rear energy impingement of a component composite configuration.

    摘要翻译: 一种用于相互接触的两个晶片型部件复合结构相互接触的方法和装置,所述两个晶片型部件复合结构由相干地实现的多个相同部件,特别是具有功能部件晶片(14)的半导体晶片(12)制成,以在其上产生电子组件 晶片级,其中部件复合结构各自位于插座单元(11; 13)上,并且以相互连接的部件复合结构的接触金属化之间的接触所需的接触压力被产生,使得 在接收室中产生真空,该接触室接收组件复合结构,并由容器单元限定,并且接触金属化的接触通过组件复合构造的后能量冲击来执行。

    Method And Device For Alternately Contacting Two Wafers
    2.
    发明申请
    Method And Device For Alternately Contacting Two Wafers 有权
    用于交替接触两个晶片的方法和装置

    公开(公告)号:US20070272991A1

    公开(公告)日:2007-11-29

    申请号:US10581819

    申请日:2004-12-02

    IPC分类号: H01L21/00 B23K1/00 H01L29/66

    摘要: A method and device for alternately contacting two wafer-like component composite arrangements (12, 14) consisting of a plurality of cohesively designed similar components, in particular of a semiconductor wafer with a function component wafer for manufacturing electronic modules on a wafer level, in which the two component composite arrangements, each provided with contact metallizations on their opposing contact surfaces (38, 39), are brought into a coverage position with their contact metallizations to form contact pairs, in which position the contact metallizations that are to be joined together are pressed against one another, the contact metallizations being thereby contacted by exposing the rear of one of the component composite arrangements (12) to laser radiation (20), the wavelength of the laser radiation being selected as a function of the degree of absorption of the component composite arrangement exposed to laser radiation at the rear, so that a transmission of the laser radiation through the component composite arrangement exposed to the laser radiation at the rear is essentially suppressed or an absorption of the laser radiation takes place essentially in the contact metallizations of one or both component composite arrangements.

    摘要翻译: 交替地接触由多个内聚设计的类似部件组成的两个晶片状部件复合布置(12,14)的方法和装置,特别是具有用于在晶片级上制造电子模块的功能元件晶片的半导体晶片, 其中每个在其相对的接触表面(38,39)上设置有接触金属化的双组分复合布置通过它们的接触金属化进入覆盖位置,以形成接触对,在该位置上将要接合在一起的接触金属化 因此,通过将组件复合装置(12)中的一个的后部暴露于激光辐射(20),接触金属化从而接触,激光辐射的波长被选择为吸收程度的函数 组件复合布置暴露在后面的激光辐射,使得传输 通过暴露于后方的激光辐射的组分复合布置的激光辐射基本上被抑制,或者激光辐射的吸收基本上在一个或两个组件复合布置的接触金属化中发生。

    Device for applying solder globules
    3.
    发明授权
    Device for applying solder globules 失效
    焊球应用装置

    公开(公告)号:US06915940B2

    公开(公告)日:2005-07-12

    申请号:US10474450

    申请日:2002-04-12

    摘要: An apparatus for applying solder balls to a substrate and for remelting the solder balls on soldering points of the substrate has a capillary for supplying a solder ball to the soldering points and for placing the solder ball at the free end of the capillary opposite the soldering point, a means for supplying heat to the solder ball to remelt it, and a pressing apparatus for holding down the substrate to prevent the substrate from being resilient when placing and remelting the solder ball.

    摘要翻译: 用于将焊球用于衬底并在衬底的焊接点上重新焊接焊球的设备具有毛细管,用于将焊球提供给焊接点,并将焊球放置在与焊接点相对的毛细管自由端处 用于向焊球供热以重新熔化的装置,以及用于按压衬底以防止衬底在放置和重熔焊球时具有弹性的按压装置。

    Device for alternately contacting two wafers
    6.
    发明授权
    Device for alternately contacting two wafers 有权
    用于交替接触两个晶片的装置

    公开(公告)号:US07932611B2

    公开(公告)日:2011-04-26

    申请号:US10581819

    申请日:2004-12-02

    IPC分类号: H01L23/48

    摘要: A method and device for alternately contacting two wafer-like component composite arrangements, in which the two component composite arrangements, provided with contact metallizations on their opposing contact surfaces, are brought into a coverage position with their contact metallizations to form contact pairs, in which position the contact metallizations to be joined together are pressed against one another, the contact metallizations being contacted by exposing the rear of one of the component composite arrangements to laser radiation, the wavelength of the laser radiation being selected as a function of the degree of absorption of the component composite arrangement , so that a transmission of the laser radiation through the component composite arrangement exposed to the laser radiation at the rear is essentially suppressed or an absorption of the laser radiation takes place essentially in the contact metallizations of one or both component composite arrangements.

    摘要翻译: 用于交替接触两个晶片状部件复合布置的方法和装置,其中在其相对的接触表面上设置有接触金属化的双组分复合布置通过它们的接触金属化进入覆盖位置以形成接触对,其中 定位要接合在一起的接触金属化彼此压靠,接触金属化通过将组件复合结构中的一个的后部暴露于激光辐射而接触,激光辐射的波长被选择为吸收程度的函数 的组件复合布置,使得激光辐射通过暴露于后面的激光辐射的组件复合结构的传输基本上被抑制或激光辐射的吸收基本上在一个或两个组件复合材料的接触金属化中发生 安排

    Method and device for drying circuit substrates
    9.
    发明授权
    Method and device for drying circuit substrates 有权
    电路基板干燥方法及装置

    公开(公告)号:US08256131B2

    公开(公告)日:2012-09-04

    申请号:US10582421

    申请日:2004-12-22

    IPC分类号: F26B3/30

    CPC分类号: H01L21/67034 F26B3/30

    摘要: Method and device for drying circuit substrates (13), in particular semiconductor substrates, in which a circuit surface (30) of the circuit substrate is flushed using a flushing liquid (10) in a flushing step and the circuit surface is dried in a subsequent drying step, the circuit substrate being moved in the flushing step in the direction of its planar extension transversely and in relation to a liquid level (28) of the flushing liquid in such a way that a liquid meniscus forms at a transition area between the circuit surface and the liquid level, which changes because of the relative movement, and thermal radiation (36) is applied to the transition area wetted by the liquid meniscus in the drying step.

    摘要翻译: 用于干燥电路基板(13)的方法和装置,特别是在冲洗步骤中使用冲洗液(10)冲洗电路基板的电路表面(30)的电路基板(13),并且电路表面随后被干燥 干燥步骤,电路基板在冲洗步骤中沿其平面延伸方向横向移动并相对于冲洗液体的液面(28)移动,使得液体弯液面在电路之间的过渡区域处形成 表面和由于相对运动而变化的液面,并且在干燥步骤中将热辐射(36)施加到由液体弯液面润湿的过渡区域。

    Method and Device for Transferring a Solder Deposit Configuration
    10.
    发明申请
    Method and Device for Transferring a Solder Deposit Configuration 有权
    用于传送焊料沉积配置的方法和装置

    公开(公告)号:US20080302863A1

    公开(公告)日:2008-12-11

    申请号:US11666188

    申请日:2005-09-26

    IPC分类号: B23K31/02 B23K3/06

    摘要: Method and device for transferring a solder deposit configuration having multiple solder deposits onto a terminal surface configuration of a contact surface of a substrate (36) using a removal of multiple solder deposits from a solder deposit reservoir (25) accommodated in a solder deposit receptacle unit (11) via an isolation unit (12), which is implemented like a template and is situated above the solder deposit reservoir, to implement the solder deposit configuration implemented corresponding to the terminal surface configuration, and using a subsequent transfer of the solder deposit configuration onto the terminal surface configuration of the substrate, the solder deposit reservoir being impinged by partial vacuum through template openings (15) of the isolation unit to transfer the solder deposits from the solder deposit reservoir into the isolation unit, the solder deposit reservoir (25) being ventilated via a floor wall (20) situated diametrically opposite the isolation unit during the partial vacuum impingement (27) by the isolation unit (12).

    摘要翻译: 用于将具有多个焊料沉积物的焊料沉积物配置转移到衬底(36)的接触表面的端子表面构造上的方法和装置,其使用从容纳在焊料沉积容器单元中的焊料沉积物储存器(25)去除多个焊料沉积物 (11),其被实现为模板并且位于焊料沉积物储存器上方,以实现对应于端子表面构造实施的焊料沉积配置,并且使用随后的焊料沉积配置的转移 在衬底的端子表面结构上,焊料沉积储存器通过隔离单元的模板开口(15)通过部分真空冲击,以将焊料沉积物从焊料沉积储存器转移到隔离单元中,焊料沉积储存器(25) 通过位于与隔离单元直径相对的地板壁(20)通风 通过隔离单元(12)引起部分真空冲击(27)。