Invention Grant
- Patent Title: Method and apparatus for spacer-optimization (S-O)
- Patent Title (中): 间隔优化方法和装置（S-O）
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Application No.: US11859507Application Date: 2007-09-21
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Publication No.: US07939450B2Publication Date: 2011-05-10
- Inventor: Asao Yamashita , Merritt Funk , Daniel J. Prager , Lee Chen , Radha Sundararajan
- Applicant: Asao Yamashita , Merritt Funk , Daniel J. Prager , Lee Chen , Radha Sundararajan
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Main IPC: H01L21/302
- IPC: H01L21/302 ; H01L21/461
Abstract:
The invention can provide a method of processing a substrate using S-O processing sequences and evaluation libraries that can include one or more optimized spacer creation and evaluation procedures.
Public/Granted literature
- US20090081815A1 Method and Apparatus for Spacer-Optimization (S-O) Public/Granted day:2009-03-26
Information query
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