发明授权
- 专利标题: Structure for symmetrical capacitor
- 专利标题(中): 对称电容器结构
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申请号: US12851814申请日: 2010-08-06
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公开(公告)号: US07939910B2公开(公告)日: 2011-05-10
- 发明人: Choongyeun Cho , Jonghae Kim , Moon J. Kim , Jean-Olivier Plouchart , Robert E. Trzcinski
- 申请人: Choongyeun Cho , Jonghae Kim , Moon J. Kim , Jean-Olivier Plouchart , Robert E. Trzcinski
- 申请人地址: US NY Armonk
- 专利权人: International Business Machines Corporation
- 当前专利权人: International Business Machines Corporation
- 当前专利权人地址: US NY Armonk
- 代理机构: Driggs, Hogg, Daugherty & Del Zoppo Co., LPA
- 代理商 Patrick J. Daugherty
- 主分类号: H01L29/00
- IPC分类号: H01L29/00
摘要:
Capacitance circuits are provided disposing a lower vertical-native capacitor metal layer above a planar front-end-of-line semiconductor base substrate, planar metal bottom plates spaced a bottom plate distance from the base and top plates above the bottom plates spaced a top plate distance from the base defining metal-insulator-metal capacitors, top plate footprints disposed above the base substrate smaller than bottom plate footprints and exposing bottom plate remainder upper lateral connector surfaces; disposing parallel positive port and negative port upper vertical-native capacitor metal layers over and each connected to top plate and bottom plate upper remainder lateral connector surface. Moreover, electrical connecting of the first top plate and the second bottom plate to the positive port metal layer and of the second top plate and the first bottom to the negative port metal layer impart equal total negative port and positive port metal-insulator-metal capacitor extrinsic capacitance.
公开/授权文献
- US20100295156A1 STRUCTURE FOR SYMMETRICAL CAPACITOR 公开/授权日:2010-11-25
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