Invention Grant
US07940373B2 Compensating masks, multi-optical systems using the masks, and methods of compensating for 3-D mask effect using the same
有权
使用掩模的补偿掩模,多光学系统以及使用其掩模的三维掩模效应的补偿方法
- Patent Title: Compensating masks, multi-optical systems using the masks, and methods of compensating for 3-D mask effect using the same
- Patent Title (中): 使用掩模的补偿掩模,多光学系统以及使用其掩模的三维掩模效应的补偿方法
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Application No.: US11925014Application Date: 2007-10-26
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Publication No.: US07940373B2Publication Date: 2011-05-10
- Inventor: Sung-soo Suh , Suk-joo Lee , Han-ku Cho , Yong-jin Chun , Sung-woo Lee , Young-chang Kim
- Applicant: Sung-soo Suh , Suk-joo Lee , Han-ku Cho , Yong-jin Chun , Sung-woo Lee , Young-chang Kim
- Applicant Address: KR
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR
- Agency: Myers Bigel Sibley & Sajovec
- Priority: KR10-2006-0107947 20061102
- Main IPC: G03B27/52
- IPC: G03B27/52 ; G03B27/72 ; G03B27/32

Abstract:
Provided are a compensating mask, a multi-optical system using the compensating mask, and a method of compensating for a 3-dimensional (3-D) mask effect using the compensating mask. Methods of compensating for a 3-D mask effect using a compensating mask may include generating a first kernel corresponding to a normal mask used for forming a minute pattern, generating a second kernel corresponding to a compensating mask, mixing the first kernel corresponding to the normal mask with the second kernel corresponding to the compensating mask, and generating a multi-optical system kernel corresponding to mixing the first kernel and the second kernel.
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