发明授权
US07943885B2 Laser irradiation method and method of manufacturing semiconductor device 有权
激光照射方法及制造半导体器件的方法

Laser irradiation method and method of manufacturing semiconductor device
摘要:
By laser beam being slantly incident to the diffractive optics, an aberration such as astigmatism or the like is occurred, and the shape of the laser beam is made linear on the irradiation surface or in its neighborhood. Since the device has a very simple configuration, the optical adjustment is easier, and the device becomes compact in size. Furthermore, since the beam is slantly incident with respect to the irradiated body, the return beam can be prevented.
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