发明授权
US07948079B2 Method of manufacturing hybrid structure of multi-layer substrates and hybrid structure thereof 有权
制造多层基板的混合结构及其混合结构的方法

  • 专利标题: Method of manufacturing hybrid structure of multi-layer substrates and hybrid structure thereof
  • 专利标题(中): 制造多层基板的混合结构及其混合结构的方法
  • 申请号: US12549289
    申请日: 2009-08-27
  • 公开(公告)号: US07948079B2
    公开(公告)日: 2011-05-24
  • 发明人: Chih-kuang Yang
  • 申请人: Chih-kuang Yang
  • 申请人地址: TW Hsinchu
  • 专利权人: Princo Corp.
  • 当前专利权人: Princo Corp.
  • 当前专利权人地址: TW Hsinchu
  • 主分类号: H01L29/40
  • IPC分类号: H01L29/40
Method of manufacturing hybrid structure of multi-layer substrates and hybrid structure thereof
摘要:
Disclosed is a method of manufacturing a hybrid structure of multi-layer substrates. The method comprises steps of: separating a border district of at least one metal layer connecting with a border district of the corresponding dielectric layer from adjacent metal layers and adjacent dielectric layers for each multi-layer substrate and connecting a separated border of a metal layer of one multi-layer substrate with a separated border district of a metal layer of another multi-layer substrate to form a connection section. The hybrid structure comprises at least a first multi-layer substrate and a second multi-layer substrate. At least one first metal layer is connected with at least one second metal layer to form a connection section.
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