Invention Grant
- Patent Title: Nonvolatile memory devices and method of manufacturing the same
- Patent Title (中): 非易失性存储器件及其制造方法
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Application No.: US12010921Application Date: 2008-01-31
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Publication No.: US07956343B2Publication Date: 2011-06-07
- Inventor: Yong-wook Kwon , Chul-soon Kwon , Young-cheon Jeong
- Applicant: Yong-wook Kwon , Chul-soon Kwon , Young-cheon Jeong
- Applicant Address: KR Gyeonggi-do
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Gyeonggi-do
- Agency: Harness, Dickey & Pierce, P.L.C.
- Priority: KR10-2007-0010703 20070201
- Main IPC: H01L47/00
- IPC: H01L47/00

Abstract:
Example embodiments provide a nonvolatile memory device using resistive elements. The nonvolatile memory device may include a semiconductor substrate, a plurality of variable resistance patterns on the semiconductor substrate, and a plurality of heat sink patterns that are level with the variable resistance patterns and coupled to a ground voltage.
Public/Granted literature
- US20080185568A1 Nonvolatile memory devices and method of manufacturing the same Public/Granted day:2008-08-07
Information query
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