Invention Grant
- Patent Title: Semiconductor laser and method of making semiconductor laser
- Patent Title (中): 半导体激光器及制造半导体激光器的方法
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Application No.: US12464262Application Date: 2009-05-12
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Publication No.: US07957446B2Publication Date: 2011-06-07
- Inventor: Hideki Yagi
- Applicant: Hideki Yagi
- Applicant Address: JP Osaka
- Assignee: Sumitomo Electric Industries, Ltd.
- Current Assignee: Sumitomo Electric Industries, Ltd.
- Current Assignee Address: JP Osaka
- Agency: Smith, Gambrell & Russell, LLP
- Priority: JP2008-207041 20080811
- Main IPC: H01S5/00
- IPC: H01S5/00

Abstract:
A semiconductor laser includes a first optical confinement layer, a plurality of first quantum wires and buried semiconductor regions disposed on a first area, a plurality of second quantum wires and buried semiconductor regions disposed on a second area, an active layer disposed on a third area, and a second optical confinement layer. The plurality of first quantum wires and the buried semiconductor regions constitute a first distributed Bragg reflector, and the plurality of second quantum wires and the buried semiconductor regions constitute a second distributed Bragg reflector. The third area is disposed between the first area and the second area. The buried semiconductor regions have a refractive index different from the average refractive index of the first quantum wires and the average refractive index of the second quantum wires. These distributed Bragg reflectors form a DBR laser having a cavity length defined by the length of the active layer.
Public/Granted literature
- US20100034229A1 SEMICONDUCTOR LASER AND METHOD OF MAKING SEMICONDUCTOR LASER Public/Granted day:2010-02-11
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