发明授权
US07960033B2 Transparent conductive film, sintered body target for transparent conductive film fabrication, and transparent conductive base material and display device using the same 有权
透明导电膜,透明导电膜制造用烧结体靶,透明导电性基材及使用其的显示装置

Transparent conductive film, sintered body target for transparent conductive film fabrication, and transparent conductive base material and display device using the same
摘要:
A transparent conductive film which is amorphous, has a high transmittance of light in the visible region of short wavelengths, and is hard to beak with respect to bending is provided. The transparent conductive film is an amorphous oxide film composed of Ga, In, and O, in which a Ga content ranges from 35 at. % to 45 at. % with respect to all metallic atoms, a resistivity ranges 1.2×10−3 Ω·cm to 8.0×10−3 Ω·cm a film thickness is 500 nm or less, and a transmittance of light at a wavelength of 380 nm is 45% or more.
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