Invention Grant
- Patent Title: Ultraviolet reflector with coolant gas holes and method
- Patent Title (中): 具有冷却剂气孔的紫外线反射器及方法
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Application No.: US12255609Application Date: 2008-10-21
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Publication No.: US07964858B2Publication Date: 2011-06-21
- Inventor: Yao-Hung Yang , Tuan Anh Nguyen , Sanjeev Baluja , Andrzej Kaszuba , Juan Carlos Rocha , Thomas Nowak , Dustin W. Ho
- Applicant: Yao-Hung Yang , Tuan Anh Nguyen , Sanjeev Baluja , Andrzej Kaszuba , Juan Carlos Rocha , Thomas Nowak , Dustin W. Ho
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Janah & Associates
- Main IPC: G01N21/33
- IPC: G01N21/33 ; B01J19/08 ; B29C35/08
Abstract:
A reflector for an ultraviolet lamp can be used in a substrate processing apparatus. The reflector comprises a longitudinal strip extending the length of the ultraviolet lamp. The longitudinal strip has a curved reflective surface and comprises a plurality of through holes to direct a coolant gas toward the ultraviolet lamp. A chamber that uses an ultraviolet lamp module with the reflector, and a method of ultraviolet treatment are also described.
Public/Granted literature
- US20100096564A1 ULTRAVIOLET REFLECTOR WITH COOLANT GAS HOLES AND METHOD Public/Granted day:2010-04-22
Information query
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