Invention Grant
US07968940B2 Insulated gate bipolar transistor device comprising a depletion-mode MOSFET
有权
绝缘栅双极晶体管器件包括耗尽型MOSFET
- Patent Title: Insulated gate bipolar transistor device comprising a depletion-mode MOSFET
- Patent Title (中): 绝缘栅双极晶体管器件包括耗尽型MOSFET
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Application No.: US11863231Application Date: 2007-09-27
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Publication No.: US07968940B2Publication Date: 2011-06-28
- Inventor: Florin Udrea
- Applicant: Florin Udrea
- Applicant Address: TW Hsinchu Science Park, Hsin-Chu
- Assignee: Anpec Electronics Corporation
- Current Assignee: Anpec Electronics Corporation
- Current Assignee Address: TW Hsinchu Science Park, Hsin-Chu
- Agent Winston Hsu; Scott Margo
- Main IPC: H01L29/66
- IPC: H01L29/66

Abstract:
Double gate IGBT having both gates referred to a cathode in which a second gate is for controlling flow of hole current. In on-state, hole current can be largely suppressed. While during switching, hole current is allowed to flow through a second channel. Incorporating a depletion-mode p-channel MOSFET having a pre-formed hole channel that is turned ON when 0V or positive voltages below a specified threshold voltage are applied between second gate and cathode, negative voltages to the gate of p-channel are not used. Providing active control of holes amount that is collected in on-state by lowering base transport factor through increasing doping and width of n well or by reducing injection efficiency through decreasing doping of deep p well. Device includes at least anode, cathode, semiconductor substrate, n− drift region, first & second gates, n+ cathode region; p+ cathode short, deep p well, n well, and pre-formed hole channel.
Public/Granted literature
- US20090008674A1 DOUBLE GATE INSULATED GATE BIPOLAR TRANSISTOR Public/Granted day:2009-01-08
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