Invention Grant
- Patent Title: System and method for defect localization on electrical test structures
- Patent Title (中): 电气测试结构的缺陷定位系统和方法
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Application No.: US10530157Application Date: 2003-10-03
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Publication No.: US07969564B2Publication Date: 2011-06-28
- Inventor: Gilad Almogy , Chris Talbot , Lior Levin
- Applicant: Gilad Almogy , Chris Talbot , Lior Levin
- Applicant Address: IL Rehovot
- Assignee: Applied Materials Israel, Ltd.
- Current Assignee: Applied Materials Israel, Ltd.
- Current Assignee Address: IL Rehovot
- Agency: SNR Denton US LLP
- International Application: PCT/US03/31398 WO 20031003
- International Announcement: WO2004/031791 WO 20040415
- Main IPC: G01N21/00
- IPC: G01N21/00

Abstract:
A method and system for defect localization includes: (i) receiving a test structure that includes at least one conductor that is at least partially covered by an electro-optically active material; (ii) providing an electrical signal to the conductor, such as charge at least a portion of the conductor; and (iii) imaging the test structure to locate a defect.
Public/Granted literature
- US20060192904A1 System and method for defect localization on electrical test structures Public/Granted day:2006-08-31
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