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US07969568B2 Spectrographic metrology of patterned wafers 有权
图案化晶圆的光谱测量

Spectrographic metrology of patterned wafers
摘要:
Light reflected from respective image elements of a workpiece is channeled through respective light channeling elements to respective locations of a spectrographic light disperser. Spectral distributions of the respective image elements produced by the spectrographic light disperser are recorded. A processor groups similar spectral distributions into respective groups of mutually similar distributions, and classifies the groups by the number of distributions contained in each group.
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