发明授权
- 专利标题: Spectrographic metrology of patterned wafers
- 专利标题(中): 图案化晶圆的光谱测量
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申请号: US12369627申请日: 2009-02-11
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公开(公告)号: US07969568B2公开(公告)日: 2011-06-28
- 发明人: James Matthew Holden , Edgar Genio , Todd J. Egan
- 申请人: James Matthew Holden , Edgar Genio , Todd J. Egan
- 申请人地址: US CA Santa Clara
- 专利权人: Applied Materials, Inc.
- 当前专利权人: Applied Materials, Inc.
- 当前专利权人地址: US CA Santa Clara
- 代理商 Robert M. Wallace
- 主分类号: G01J3/00
- IPC分类号: G01J3/00
摘要:
Light reflected from respective image elements of a workpiece is channeled through respective light channeling elements to respective locations of a spectrographic light disperser. Spectral distributions of the respective image elements produced by the spectrographic light disperser are recorded. A processor groups similar spectral distributions into respective groups of mutually similar distributions, and classifies the groups by the number of distributions contained in each group.
公开/授权文献
- US20100103411A1 SPECTROGRAPHIC METROLOGY OF PATTERNED WAFERS 公开/授权日:2010-04-29
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