中科微点-全球专利检索

  1. Login
  2. Sign Up

Search Results

19 records (took 0.013 seconds)

    Normal Incidence Broadband Spectroscopic Polarimeter and Optical Measurement System
    1.
    发明申请
    Normal Incidence Broadband Spectroscopic Polarimeter and Optical Measurement System 有权
    正常发生宽带光谱偏振仪和光学测量系统

    公开(公告)号：US20130050702A1

    公开(公告)日：2013-02-28

    申请号：US13696054

    申请日：2011-06-01

    Applicant: Guoguang Li ,  Tao Liu ,  Edgar Genio ,  Tiezhong Ma ,  Xiaolang Yan

    Inventor： Guoguang Li ,  Tao Liu ,  Edgar Genio ,  Tiezhong Ma ,  Xiaolang Yan

    IPC: G01J3/447

    CPC classification number: G01N21/211 ,  G01J3/02 ,  G01J3/0208 ,  G01J3/021 ,  G01J3/0224 ,  G01N21/21

    Abstract: A kind of normal incidence broadband spectroscopic polarimeter which is easy to adjust the focus, has no chromatic aberration, maintains the polarization and has simple structure. The normal incidence broadband spectroscopic polarimeter can make the probe beam normal incidence and focus on the sample surface by using at least one flat reflector element to change propagation direction of the focused beam. Moreover, the normal incidence broadband spectroscopic polarimeter contains at least one polarizer as to measure the anisotropy or non-uniform samples, such as three-dimensional profile and material optical constants of thin films consisting of the periodic structure. An optical measurement system including the normal incidence broadband spectroscopic polarimeter is also provided.

    Abstract translation: 一种正常入射的宽带光谱旋光计，易于调焦，无色差，维持极化，结构简单。 正常入射的宽带光谱旋光仪可以通过使用至少一个平面反射器元件来改变聚焦光束的传播方向，使探针光束正常入射并聚焦在样品表面上。 此外，正常入射的宽带光谱旋光计包含至少一个偏振器，用于测量各向异性或非均匀样品，例如由周期性结构构成的薄膜的三维轮廓和材料光学常数。 还提供了包括正常入射宽带光谱旋光计的光学测量系统。

    Evaluation of openings in a dielectric layer
    2.
    发明申请
    Evaluation of openings in a dielectric layer 失效
    评估电介质层中的开口

    公开(公告)号：US20060094136A1

    公开(公告)日：2006-05-04

    申请号：US10979397

    申请日：2004-11-01

    Applicant: Peter Borden ,  Jiping Li ,  Edgar Genio

    Inventor： Peter Borden ,  Jiping Li ,  Edgar Genio

    IPC: H01L21/66 ,  H01L21/00

    CPC classification number: G01N21/171 ,  G01N21/95684 ,  G01N21/95692 ,  H01L22/20

    Abstract: A patterned dielectric layer is evaluated by measuring reflectance of a region which has openings. A heating beam may be chosen for having reflectance from an underlying conductive layer that is several times greater than absorptance, to provide a heightened sensitivity to presence of residue and/or changes in dimension of the openings. Reflectance may be measured by illuminating the region with a heating beam modulated at a preset frequency, and measuring power of a probe beam that reflects from the region at the preset frequency. Openings of many embodiments have sub-wavelength dimensions (i.e. smaller than the wavelength of the heating beam). The underlying conductive layer may be patterned into links of length smaller than the diameter of heating beam, so that the links float to a temperature higher than a corresponding temperature attained by a continuous trace that transfers heat away from the illuminated region by conduction.

    Abstract translation: 通过测量具有开口的区域的反射率来评估图案化的介电层。 加热束可以被选择为具有比吸收率大几倍的下层导电层的反射率，以提供对残留物的存在和/或开口尺寸变化的更高的灵敏度。 反射率可以通过以预设频率调制的加热光束照射该区域并测量从预设频率的区域反射的探测光束的功率来测量。 许多实施例的开口具有亚波长尺寸（即小于加热束的波长）。 底层导电层可以被图案化成长度小于加热束直径的链节，使得链节浮动到高于通过传导将热量从照射区域传递的连续迹线获得的相应温度的温度。

    BROADBAND POLARIZATION SPECTROMETER WITH INCLINED INCIDENCE AND OPTICAL MEASUREMENT SYTEM
    6.
    发明申请
    BROADBAND POLARIZATION SPECTROMETER WITH INCLINED INCIDENCE AND OPTICAL MEASUREMENT SYTEM 有权
    带有入射和光学测量的宽带偏振光谱仪

    公开(公告)号：US20130070234A1

    公开(公告)日：2013-03-21

    申请号：US13701698

    申请日：2011-05-30

    Applicant: Guoguang Li ,  Tao Liu ,  Edgar Genio ,  Tiezhong Ma ,  Yan Xiaolang

    Inventor： Guoguang Li ,  Tao Liu ,  Edgar Genio ,  Tiezhong Ma ,  Yan Xiaolang

    IPC: G01N21/21

    CPC classification number: G01N21/211 ,  G01J3/02 ,  G01J3/0208 ,  G01J3/021 ,  G01J3/0224 ,  G01N21/21

    Abstract: An oblique incidence broadband spectroscopic polarimeter which is easy to adjust the focus, achromatic, maintains the polarization and has simple structure is provided. It comprise at least one polarizer (P, A), at least one curved reflector element (OAP1, OAP2, OAP3, OAP4) and at least two flat reflector elements (M1, M2). By utilizing the flat reflector element, the oblique incidence broadband spectroscopic polarimeter can change the propagate direction of beam, and compensate the polarization changes caused by the reflective focusing unit, make the polarization of beam passed the polarizer unchanged when obliquely incident and focus on the sample surface. The oblique incidence broadband spectroscopic polarimeter can accurately measure the optical constants of sample material, film thickness, and/or the critical dimension (CD) properties or three-dimensional profile for analyze the periodic structure of the sample. An optical measurement system including the oblique incidence broadband spectroscopic polarimeter is also provided.

    Abstract translation: 提供了一种倾斜入射宽带光谱旋光计，其易于调节焦点，消色差，保持偏振并且具有简单的结构。 它包括至少一个偏振器（P，A），至少一个弯曲反射器元件（OAP1，OAP2，OAP3，OAP4）和至少两个平面反射器元件（M1，M2）。 通过利用平面反射元件，倾斜入射宽带光谱旋光计可以改变光束的传播方向，并补偿由反射聚焦单元引起的偏振变化，使得当倾斜入射时光束的偏振通过偏振器不变，并聚焦在样品上 表面。 倾斜入射宽带光谱旋光计可以精确测量样品材料的光学常数，膜厚度和/或临界尺寸（CD）性质或三维轮廓，以分析样品的周期性结构。 还提供了包括斜入射宽带光谱偏振计的光学测量系统。

    SPECTROMETRIC METROLOGY OF WORKPIECES USING A PERMANENT WINDOW AS A SPECTRAL REFERENCE
    8.
    发明申请
    SPECTROMETRIC METROLOGY OF WORKPIECES USING A PERMANENT WINDOW AS A SPECTRAL REFERENCE 有权
    使用永久窗口作为光谱参考的工件的光谱计量

    公开(公告)号：US20110130995A1

    公开(公告)日：2011-06-02

    申请号：US13025064

    申请日：2011-02-10

    Applicant: Edgar Genio ,  Edward W. Budiarto

    Inventor： Edgar Genio ,  Edward W. Budiarto

    IPC: G01J3/40 ,  G01J3/30 ,  G06F19/00

    CPC classification number: G01J3/02 ,  G01J3/0205 ,  G01J3/0218 ,  G01J3/027 ,  G01J3/0291 ,  G01J3/2803 ,  G01N21/276

    Abstract: In a spectrographic workpiece metrology system having an optical viewing window, the viewing window is calibrated against a reference sample of a known absolute reflectance spectrum to produce a normalized reflectance spectrum of the reference sample, which is combined with the absolute reflectance spectrum to produce a correction factor. Successive production workpieces are measured through the window and calibrated against the viewing window reflectance, and transformed to absolute reflectance spectra using the same correction factor without having to re-load the reference sample.

    Abstract translation: 在具有光学观察窗口的光谱工件测量系统中，观察窗口针对已知绝对反射光谱的参考样本进行校准，以产生参考样本的归一化反射光谱，其与绝对反射光谱相结合以产生校正 因子。 通过窗口测量连续生产工件，并根据观察窗反射率进行校准，并使用相同的校正因子将其转换为绝对反射光谱，而无需重新加载参考样品。

    SPECTROMETRIC METROLOGY OF WORKPIECES USING A PERMANENT WINDOW AS A SPECTRAL REFERENCE
    9.
    发明申请
    SPECTROMETRIC METROLOGY OF WORKPIECES USING A PERMANENT WINDOW AS A SPECTRAL REFERENCE 有权
    使用永久窗口作为光谱参考的工件的光谱计量

    公开(公告)号：US20100106444A1

    公开(公告)日：2010-04-29

    申请号：US12388222

    申请日：2009-02-18

    Applicant: EDGAR GENIO ,  EDWARD W. BUDIARTO

    Inventor： EDGAR GENIO ,  EDWARD W. BUDIARTO

    IPC: G01J3/40 ,  G01J3/30 ,  G06F19/00

    CPC classification number: G01J3/02 ,  G01J3/0205 ,  G01J3/0218 ,  G01J3/027 ,  G01J3/0291 ,  G01J3/2803 ,  G01N21/276

    Abstract: In a spectrographic workpiece metrology system having an optical viewing window, the viewing window is calibrated against a reference sample of a known absolute reflectance spectrum to produce a normalized reflectance spectrum of the reference sample, which is combined with the absolute reflectance spectrum to produce a correction factor. Successive production workpieces are measured through the window and calibrated against the viewing window reflectance, and transformed to absolute reflectance spectra using the same correction factor without having to re-load the reference sample.

    Abstract translation: 在具有光学观察窗口的光谱工件测量系统中，观察窗口针对已知绝对反射光谱的参考样本进行校准，以产生参考样本的归一化反射光谱，其与绝对反射光谱相结合以产生校正 因子。 通过窗口测量连续生产工件，并根据观察窗反射率进行校准，并使用相同的校正因子将其转换为绝对反射光谱，而无需重新加载参考样品。

Patent Agency Ranking