Invention Grant
US07970199B2 Method and apparatus for detecting defect on a surface of a specimen
失效
用于检测试样表面的缺陷的方法和装置
- Patent Title: Method and apparatus for detecting defect on a surface of a specimen
- Patent Title (中): 用于检测试样表面的缺陷的方法和装置
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Application No.: US11757458Application Date: 2007-06-04
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Publication No.: US07970199B2Publication Date: 2011-06-28
- Inventor: Minoru Yoshida , Yoshimasa Oshima
- Applicant: Minoru Yoshida , Yoshimasa Oshima
- Applicant Address: JP Tokyo
- Assignee: Hitachi High-Technologies Corporation
- Current Assignee: Hitachi High-Technologies Corporation
- Current Assignee Address: JP Tokyo
- Agency: Antonelli, Terry, Stout & Kraus, LLP.
- Priority: JP2006-155892 20060605
- Main IPC: G06K9/00
- IPC: G06K9/00 ; G01B11/02

Abstract:
A surface inspection apparatus is provided based on an optical interference scheme using a wide-band laser light source, such as diode laser, for an interferometer. In the apparatus, a diode laser with a large spectrum width having a short coherence length is used as an emitted light source; modulation optical elements for performing modulation with slightly different frequencies, and optical path length varying optical elements for adjusting the optical path length are located in each of two optical paths between a branching optical element and a combining optical element; and the above-mentioned optical path length varying optical elements are adjusted, while measuring an interference intensity, so as to maximize the interference intensity.
Public/Granted literature
- US20070285670A1 METHOD AND APPARATUS FOR DETECTING DEFECT ON A SURFACE OF A SPECIMEN Public/Granted day:2007-12-13
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