Invention Grant
- Patent Title: Vertical continuous vacuum pan
- Patent Title (中): 垂直连续真空盘
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Application No.: US12225509Application Date: 2006-09-25
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Publication No.: US07972445B2Publication Date: 2011-07-05
- Inventor: Jai Parkash Singh , Vipin Kumar Gupta , Saroj Kumar Singh
- Applicant: Jai Parkash Singh , Vipin Kumar Gupta , Saroj Kumar Singh
- Applicant Address: IN Chandigarth
- Assignee: Spray Engineering Devices Limited
- Current Assignee: Spray Engineering Devices Limited
- Current Assignee Address: IN Chandigarth
- Agency: Ladas & Parry LLP
- Priority: IN879/DEL/2006 20060330
- International Application: PCT/IN2006/000389 WO 20060925
- International Announcement: WO2007/113849 WO 20071011
- Main IPC: C13B30/02
- IPC: C13B30/02

Abstract:
The present invention consists of an improved vertical continuous vacuum pan apparatus consisting of eight chambers (2) (instead of four or five) and a storage or buffer tank (27) at the top, within the existing conventional height, characterized in that each chamber has a bottom mounted mechanical circulator housed in an insulated pocket (28) in the vapour space segment (29) of each chamber and not in additional space above the chamber.
Public/Granted literature
- US20090056706A1 Vertical Continuous Vacuum Pan Public/Granted day:2009-03-05
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