Invention Grant
US07980098B2 Method for producing an optical component of synthetic quartz glass with enhanced radiation resistance, and blank for producing the component
有权
用于制造具有增强的耐辐射性的合成石英玻璃的光学部件的制造方法和用于制造该部件的坯料
- Patent Title: Method for producing an optical component of synthetic quartz glass with enhanced radiation resistance, and blank for producing the component
- Patent Title (中): 用于制造具有增强的耐辐射性的合成石英玻璃的光学部件的制造方法和用于制造该部件的坯料
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Application No.: US12148338Application Date: 2008-04-18
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Publication No.: US07980098B2Publication Date: 2011-07-19
- Inventor: Bodo Kuehn , Steffen Kaiser , Denis Kassube , Kerstin Merget
- Applicant: Bodo Kuehn , Steffen Kaiser , Denis Kassube , Kerstin Merget
- Applicant Address: DE Hanau
- Assignee: Heraeus Quarzglas GmbH & Co. KG
- Current Assignee: Heraeus Quarzglas GmbH & Co. KG
- Current Assignee Address: DE Hanau
- Agency: Tiajoloff and Kelly LLP
- Priority: DE102007019154 20070420
- Main IPC: C03B25/00
- IPC: C03B25/00 ; C03B27/00 ; C03B27/012

Abstract:
To optimize an optical component of synthetic quartz glass, in the case of which a quartz glass blank is subjected to a multistage annealing treatment, with respect to compaction and central birefringence, the present invention suggests a method comprising the following steps: (a) a first treatment phase during which the quartz glass blank is treated in an upper temperature range between 1130° C. and 1240° C., (b) cooling the quartz glass blank at a first-higher-mean cooling rate to a quenching temperature below 1100° C., a fictive temperature with a high mean value of 1100° C. or more being reached in the quartz glass, (c) a second treatment phase which comprises cooling of the quartz glass blank at a second-lower-mean cooling rate, and in which the quartz glass blank is treated in a lower temperature range between 950° C. and 1100° C. such that a fictive temperature is reached in the quartz glass with a low mean value which is at least 50° C. lower than the high mean value of the fictive temperature according to method step (b).
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