公开(公告)号：US08931307B2

公开(公告)日：2015-01-13

申请号：US13499352

申请日：2010-09-28

申请人： Bodo Kuehn

发明人： Bodo Kuehn

IPC分类号： B32B17/00 ,  C03B23/13 ,  C03B23/20 ,  C03B19/14 ,  C03B32/00 ,  C03C3/06

CPC分类号： C03B23/20 ,  C03B19/1453 ,  C03B32/00 ,  C03B2201/42 ,  C03C3/06 ,  C03C2201/42 ,  G02B5/10 ,  G03F7/708 ,  Y10T428/22 ,  Y10T428/24612

摘要： On the basis of a known method for producing a blank of titanium-doped glass with a high silica content (glass) for a mirror substrate for use in EUV lithography which has a surface region that has an outer contour, is intended to be provided with a reflective coating and is specified as a highly loaded zone when the mirror substrate is used as intended, in order to provide a blank which can be produced at low cost and nevertheless meets high requirements with respect to homogeneity and freedom from blisters and striae, a procedure which comprises the following method steps is proposed: (a) producing a front body of titanium-doped high-quality glass with dimensions more than large enough to enclose the outer contour, (b) producing a cylindrical supporting body from titanium-doped glass, (c) bonding the front body and the supporting body to form a composite body, and (d) working the composite body to form the mirror substrate blank, wherein the step of producing the front body comprises a homogenizing process involving twisting a starting body obtained in the form of a strand by flame hydrolysis of a silicon-containing compound to form a front body blank, and the supporting body is formed as a monolithic glass block with less homogeneity than the front body.

摘要翻译： 基于具有高二氧化硅含量的钛掺杂玻璃的坯料的制造方法（玻璃）的基础是用于具有外表面的EUV光刻用的镜面基板，其目的是设置有 反射涂层，并且当反射镜基板按预期使用时被指定为高负载区域，以便提供可以以低成本生产的空白，并且在均匀性方面满足高要求并且不受起泡和条纹的影响， 提出了包括以下方法步骤的方法：（a）制造尺寸大到足以包围外轮廓的钛掺杂高品质玻璃的前体，（b）从掺钛玻璃制造圆柱形支撑体 ，（c）将所述前体和所述支撑体接合以形成复合体，和（d）加工所述复合体以形成所述反射镜基板坯料，其中，所述制造所述前体的步骤包括 一种均质化方法，其特征在于，通过使含硅化合物的火焰水解使绞合线形成的起始体扭转而形成前体坯料，所述支撑体形成为与前身均匀性较差的整体式玻璃块。

公开(公告)号：US07707855B2

公开(公告)日：2010-05-04

申请号：US11801386

申请日：2007-05-09

申请人： Stephan Ochs ,  Bodo Kuehn

发明人： Stephan Ochs ,  Bodo Kuehn

IPC分类号： C03B37/018

CPC分类号： C03B19/1453 ,  C03B37/01446

摘要： A known method for producing synthetic quartz glass with a predetermined hydroxyl group content comprises the following steps: a porous SiO2 soot body is produced by flame hydrolysis or oxidation of a silicon-containing start compound and by layerwise deposition of SiO2 particles on a rotating support; the soot body is subjected to a dehydration treatment in a reaction gas-containing drying atmosphere at a drying temperature for removing hydroxyl groups; and the SiO2 soot body is vitrified into a body consisting of the synthetic quartz glass. Starting from this, and in order to permit a reproducible and reliable manufacture of synthetic, UV-radiation resistant quartz glass with predetermined hydroxyl group content and low chlorine content, it is suggested according to the invention that the dehydration treatment according to method step (b) comprises a drying phase during which ozone is used as the reaction gas, whereby the ozone content of the drying atmosphere is between 0.5% by vol. and 10% by vol. and the drying temperature is chosen in the range between 1200° C. and 1400° C., and whereby no halogens are supplied to the drying atmosphere.

摘要翻译： 用于生产具有预定羟基含量的合成石英玻璃的已知方法包括以下步骤：通过含硅起始化合物的火焰水解或氧化以及通过在旋转载体上层状沉积SiO 2颗粒来制备多孔SiO 2烟炱体; 烟灰体在含反应气体的干燥气氛中，在除去羟基的干燥温度下进行脱水处理; 并且将SiO 2烟炱体玻璃化成由合成石英玻璃构成的主体。 为此，为了允许可再生和可靠地制造具有预定羟基含量和低氯含量的合成，抗紫外线辐射的石英玻璃，根据本发明，建议根据方法步骤（b）的脱水处理 ）包括使用臭氧作为反应气体的干燥阶段，由此干燥气氛的臭氧含量为0.5体积％ 和10％ 并且干燥温度选择在1200℃和1400℃之间的范围内，由此没有卤素供应到干燥气氛中。

公开(公告)号：US20100091360A1

公开(公告)日：2010-04-15

申请号：US12449790

申请日：2008-02-20

申请人： Bodo Kuehn ,  Stefan Ochs ,  Juergen Weber

发明人： Bodo Kuehn ,  Stefan Ochs ,  Juergen Weber

IPC分类号： G02B13/14 ,  C03C17/00 ,  G02B1/02

CPC分类号： C03B19/1453 ,  C03B2201/075 ,  C03B2201/10 ,  C03B2201/21 ,  C03B2201/23 ,  C03B2201/24 ,  C03B2201/32 ,  C03B2201/34 ,  C03B2201/40 ,  C03C3/06 ,  C03C2201/10 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2201/24 ,  C03C2201/32 ,  C03C2201/3411 ,  C03C2201/3441 ,  C03C2201/40 ,  G03F7/70958

摘要： To provide an optical component of quartz glass for use in a projection objective for immersion lithography at an operating wavelength below 250 nm, which component is optimized for use with linearly polarized UV laser radiation and particularly with respect to compaction and birefringence induced by anisotropic density change, it is suggested according to the invention that the quartz glass should contain hydroxyl groups in the range of from 1 wtppm to 60 wtppm and chemically bound nitrogen, and that the mean hydrogen content of the quartz glass should be in the range of 5×1015 molecules/cm to 1×1017 molecules/cm3.

摘要翻译： 为了提供石英玻璃的光学部件，用于在250nm以下的工作波长下用于浸没式光刻的投影物镜，该成分被优化用于线偏振UV激光辐射，特别是关于由各向异性密度变化引起的压实和双折射 根据本发明，建议石英玻璃应含有1〜60重量ppm的羟基和化学键合的氮，石英玻璃的平均氢含量应在5×1015的范围内 分子/ cm至1×1017分子/ cm 3。

公开(公告)号：US20070248522A1

公开(公告)日：2007-10-25

申请号：US11788007

申请日：2007-04-18

申请人： Bodo Kuehn ,  Stefan Ochs

发明人： Bodo Kuehn ,  Stefan Ochs

IPC分类号： C01B33/00 ,  C30B29/18

CPC分类号： C04B35/14 ,  C03C10/0009 ,  C04B35/645 ,  C04B2235/6565 ,  C04B2235/77 ,  C04B2235/785 ,  C04B2235/786 ,  C04B2235/94 ,  C04B2235/95 ,  C04B2235/9661

摘要： The invention is concerned with a material which shows low absorption for UV radiation having a wavelength below 250 nm, low birefringence, high chemical resistance and high radiation resistance and which is therefore particularly usable for Making optical components for microlithography. According to the invention the material consists of synthetically produced quartz crystallites which form a polycrystalline structure and have a mean grain size in the range between 500 nm and 30 μm. The method according to the invention for making a blank from the material comprises providing granules consisting of synthetically produced quartz crystals having a mean grain size in the range between 500 nm and 30 μm, and sintering the granules to obtain a blank of polycrystalline quartz.

摘要翻译： 本发明涉及对波长低于250nm，低双折射，高耐化学性和高耐辐射性的紫外线辐射的低吸收性材料，因此特别可用于制造用于微光刻的光学部件。 根据本发明，该材料由合成产生的石英晶体组成，其形成多晶结构，其平均晶粒尺寸在500nm和30μm之间的范围内。 根据本发明的用于从该材料制造坯料的方法包括提供由合成产生的平均晶粒尺寸在500nm和30μm之间的石英晶体组成的颗粒，并烧结颗粒以获得多晶石英的坯料。

公开(公告)号：US07749930B2

公开(公告)日：2010-07-06

申请号：US11630405

申请日：2006-03-30

申请人： Juergen Weber ,  Tobias Pogge ,  Martin Trommer ,  Bodo Kuehn ,  Ulrich Kirst ,  Waltraud Werdecker

发明人： Juergen Weber ,  Tobias Pogge ,  Martin Trommer ,  Bodo Kuehn ,  Ulrich Kirst ,  Waltraud Werdecker

IPC分类号： C03C3/06 ,  C03C3/04 ,  C03C15/00 ,  C03B19/00 ,  C03B21/00 ,  C03B32/00 ,  C03B25/00

CPC分类号： C03C3/06 ,  C03B19/06 ,  C03B19/09 ,  C03B32/00 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/24 ,  C03B2201/32 ,  C03C15/00 ,  C03C19/00 ,  C03C23/0025 ,  C03C23/006 ,  C03C2201/11 ,  C03C2201/12 ,  C03C2201/23 ,  C03C2201/24 ,  C03C2201/32 ,  C03C2201/50 ,  C03C2203/54 ,  C30B25/12 ,  C30B31/14 ,  C30B35/00 ,  Y02P40/57

摘要： An ideal quartz glass for a wafer jig for use in an environment having an etching effect is distinguished by both high purity and high resistance to dry etching. To indicate a quartz glass that substantially fulfills these requirements, it is suggested according to the invention that the quartz glass is doped with nitrogen at least in a near-surface area, has a mean content of metastable hydroxyl groups of less than 30 wt ppm and that its fictive temperature is below 1250° C. and its viscosity is at least 1013 dPa·s at a temperature of 1200° C. An economic method for producing such a quartz glass comprises the following method steps: melting an SiO2 raw material to obtain a quartz glass blank, the SiO2 raw material or the quartz glass blank being subjected to a dehydration measure, heating the SiO2 raw material or the quartz glass blank to a nitriding temperature in the range between 1050° C. and 1850° C. in an ammonia-containing atmosphere, a temperature treatment by means of which the quartz glass of the quartz glass blank is set to a fictive temperature of 1250° C. or less, and a surface treatment of the quartz glass blank with formation of the quartz glass jig.

摘要翻译： 用于具有蚀刻效果的环境中的晶片夹具的理想石英玻璃的特征在于高纯度和高耐干蚀刻性。 为了表明基本满足这些要求的石英玻璃，根据本发明提出，石英玻璃至少在近表面积中掺杂氮，其平均含量小于30重量ppm， 其虚拟温度低于1250℃，在1200℃的温度下其粘度至少为1013dPa·s。制备这种石英玻璃的经济方法包括以下方法步骤：将SiO 2原料熔化得到 将石英玻璃坯料，SiO 2原料或石英玻璃坯料进行脱水处理，将SiO2原料或石英玻璃坯料加热至1050℃〜1850℃的氮化温度， 含有氨的气氛，将石英玻璃坯料的石英玻璃设定为1250℃以下的假想温度的温度处理，以及格式化的石英玻璃坯料的表面处理 在石英玻璃夹具上。

公开(公告)号：US20090004088A1

公开(公告)日：2009-01-01

申请号：US12148338

申请日：2008-04-18

申请人： Bodo Kuehn ,  Steffen Kaiser ,  Denis Kassube ,  Kerstin Merget

发明人： Bodo Kuehn ,  Steffen Kaiser ,  Denis Kassube ,  Kerstin Merget

IPC分类号： C01B33/12 ,  C03B25/00

CPC分类号： C03B25/02 ,  C03B19/1453 ,  C03B32/00 ,  C03B2201/075 ,  C03B2201/21 ,  C03C3/06 ,  C03C4/0085 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2203/42 ,  C03C2203/52 ,  Y02P40/57

摘要： To optimize an optical component of synthetic quartz glass, in the case of which a quartz glass blank is subjected to a multistage annealing treatment, with respect to compaction and central birefringence, the present invention suggests a method comprising the following steps: (a) a first treatment phase during which the quartz glass blank is treated in an upper temperature range between 1130° C. and 1240° C., (b) cooling the quartz glass blank at a first-higher-mean cooling rate to a quenching temperature below 1100° C., a fictive temperature with a high mean value of 1100° C. or more being reached in the quartz glass, (c) a second treatment phase which comprises cooling of the quartz glass blank at a second-lower-mean cooling rate, and in which the quartz glass blank is treated in a lower temperature range between 950° C. and 1100° C. such that a fictive temperature is reached in the quartz glass with a low mean value which is at least 50° C. lower than the high mean value of the fictive temperature according to method step (b).

摘要翻译： 为了优化合成石英玻璃的光学部件，在石英玻璃坯料进行多段退火处理的情况下，关于压实和中心双折射，本发明提出了一种方法，包括以下步骤：（a） 第一处理阶段，其中在1130℃和1240℃之间的较高温度范围内处理石英玻璃坯料，（b）以第一高平均冷却速率将石英玻璃坯料冷却至低于1100℃的淬火温度 在石英玻璃中达到1100℃或更高平均值的假想温度，（c）第二处理阶段，其包括以第二低平均冷却速度冷却石英玻璃坯料 ，其中在950℃至1100℃的较低温度范围内处理石英玻璃坯料，使得石英玻璃中具有低至少50℃的低平均值的假想温度降低 比平均值高 根据方法步骤（b）的假想温度。

公开(公告)号：US20070272685A1

公开(公告)日：2007-11-29

申请号：US11578393

申请日：2005-04-05

申请人： Andreas Schreiber ,  Bodo Kuehn ,  Franz-Josef Schilling ,  Erich Arnold ,  Hans-Dieter Witzke

发明人： Andreas Schreiber ,  Bodo Kuehn ,  Franz-Josef Schilling ,  Erich Arnold ,  Hans-Dieter Witzke

IPC分类号： H01J61/38

CPC分类号： C03B19/01 ,  C03B19/1453 ,  C03B32/00 ,  C03B2201/03 ,  C03B2201/04 ,  C03B2201/07 ,  C03B2201/23 ,  C03C3/06

摘要： In a known method, a quartz glass component is produced for a UV radiation source by melting SiO2-containing grain. Starting therefrom, to indicate an inexpensive method by means of which a quartz glass component is obtained that is characterized by high radiation resistance, it is suggested according to the invention that synthetically produced quartz crystals are molten to obtain a pre-product which consists of quartz glass containing hydroxyl groups in a number greater than the number of SiH groups, and that for the elimination of SiH groups the pre-product is subjected to an annealing treatment at a temperature of at least 850° C., whereby the quartz glass component is obtained. In the quartz glass component of the invention, the quartz glass is molten from synthetically produced quartz crystals, and it has a content of SiH groups of less than 5×1017 molecules/cm3.

摘要翻译： 在已知的方法中，通过熔化含SiO 2的晶粒来生产用于UV辐射源的石英玻璃组分。 从其开始，为了表明一种廉价的方法，通过该方法获得了以高耐辐射性为特征的石英玻璃组分，根据本发明提出，将合成的石英晶体熔融以获得由石英组成的预制品 含有数量大于SiH基数的羟基的玻璃，并且为了除去SiH基，将前产物在至少850℃的温度下进行退火处理，由此石英玻璃成分为 获得。 在本发明的石英玻璃组分中，石英玻璃从合成产生的石英晶体熔化，并且其SiH基含量小于5×10 17分子/ cm 3 / >。

公开(公告)号：US07981824B2

公开(公告)日：2011-07-19

申请号：US11597087

申请日：2005-05-11

申请人： Wolfgang Englisch ,  Ralf Takke ,  Bodo Kuehn ,  Bruno Uebbing ,  Rainer Koeppler

发明人： Wolfgang Englisch ,  Ralf Takke ,  Bodo Kuehn ,  Bruno Uebbing ,  Rainer Koeppler

IPC分类号： C03C3/06 ,  C03B19/06 ,  C03B19/00 ,  C03B23/00 ,  C03B7/14

CPC分类号： C03B19/1469 ,  C03B2201/12 ,  C03B2201/23 ,  C03B2201/42 ,  C03C3/06 ,  C03C2201/12 ,  C03C2201/23 ,  C03C2201/42

摘要： The present invention relates to a quartz glass blank for an optical component for transmitting radiation of a wavelength of 15 nm and shorter, the blank consisting of highly pure quartz glass, doped with titanium and/or fluorine, which is distinguished by an extremely high homogeneity. The homogeneity relates to the following features: a) micro-inhomogeneities caused by a local variance of the TiO2 distribution (

摘要翻译： 本发明涉及一种用于传输波长为15nm和更短的辐射的光学部件的石英玻璃坯料，该坯料由掺杂有钛和/或氟的高纯石英玻璃组成，其特征在于极高的均匀性 。 均匀性涉及以下特征：a）相对于TiO 2含量的平均值，TiO 2分布的局部方差（<0.05％TiO 2，相对于（5μm）的体积元素平均）引起的微不均匀性） ，b）主要功能方向（<5ppb / K）的热膨胀系数＆Dgr;α的绝对最大不均匀性，c）不大于石英玻璃坯料的可用表面的热膨胀系数的径向变化 超过0.4ppb /（K.cm）; d）具有特定进展的2nm / cm 2的主要功能方向的633nm处的最大应力双折射（SDB） 和e）根据（b）在光学表面上平均的＆Dgr;α的具体进展。 所述石英玻璃坯料只能通过将含有硅，钛和/或氟的化合物的火焰水解获得的掺杂石英玻璃作为大体积的棒状起始体形成为均匀的石英玻璃坯料，其中使用几个成形步骤 并均质化。

公开(公告)号：US07954341B2

公开(公告)日：2011-06-07

申请号：US12713097

申请日：2010-02-25

申请人： Bodo Kuehn ,  Stefan Ochs

发明人： Bodo Kuehn ,  Stefan Ochs

IPC分类号： C01B33/12 ,  C01B15/14 ,  C03C3/06 ,  C04B35/14 ,  C04B14/04

CPC分类号： C04B35/14 ,  C03C10/0009 ,  C04B35/645 ,  C04B2235/6565 ,  C04B2235/77 ,  C04B2235/785 ,  C04B2235/786 ,  C04B2235/94 ,  C04B2235/95 ,  C04B2235/9661

摘要： The invention is concerned with a material which shows low absorption for UV radiation having a wavelength below 250 nm, low birefringence, high chemical resistance and high radiation resistance and which is therefore particularly usable for making optical components for microlithography. According to the invention the material consists of synthetically produced quartz crystallites which form a polycrystalline structure and have a mean grain size in the range between 500 nm and 30 μm. The method according to the invention for making a blank from the material comprises providing granules consisting of synthetically produced quartz crystals having a mean grain size in the range between 500 nm and 30 μm, and sintering the granules to obtain a blank of polycrystalline quartz.

摘要翻译： 本发明涉及对波长低于250nm，低双折射，高耐化学性和高耐辐射性的UV辐射的吸收低的材料，因此特别可用于制造用于微光刻的光学部件。 根据本发明，该材料由合成产生的石英晶体组成，其形成多晶结构，其平均晶粒尺寸在500nm至30μm的范围内。 根据本发明的用于从该材料制造坯料的方法包括提供由合成产生的平均晶粒尺寸在500nm和30μm之间的石英晶体组成的颗粒，并烧结颗粒以获得多晶石英的坯料。

公开(公告)号：US20100147027A1

公开(公告)日：2010-06-17

申请号：US12713097

申请日：2010-02-25

申请人： Bodo Kuehn ,  Stefan Ochs

发明人： Bodo Kuehn ,  Stefan Ochs

IPC分类号： C03B32/00

CPC分类号： C04B35/14 ,  C03C10/0009 ,  C04B35/645 ,  C04B2235/6565 ,  C04B2235/77 ,  C04B2235/785 ,  C04B2235/786 ,  C04B2235/94 ,  C04B2235/95 ,  C04B2235/9661

摘要： The invention is concerned with a material which shows low absorption for UV radiation having a wavelength below 250 nm, low birefringence, high chemical resistance and high radiation resistance and which is therefore particularly usable for making optical components for microlithography. According to the invention the material consists of synthetically produced quartz crystallites which form a polycrystalline structure and have a mean grain size in the range between 500 nm and 30 μm. The method according to the invention for making a blank from the material comprises providing granules consisting of synthetically produced quartz crystals having a mean grain size in the range between 500 nm and 30 μm, and sintering the granules to obtain a blank of polycrystalline quartz.

摘要翻译： 本发明涉及对波长低于250nm，低双折射，高耐化学性和高耐辐射性的UV辐射的吸收低的材料，因此特别可用于制造用于微光刻的光学部件。 根据本发明，该材料由合成产生的石英晶体组成，其形成多晶结构，其平均晶粒尺寸在500nm至30μm的范围内。 根据本发明的用于从该材料制造坯料的方法包括提供由合成产生的平均晶粒尺寸在500nm和30μm之间的石英晶体组成的颗粒，并烧结颗粒以获得多晶石英的坯料。