Invention Grant
US07988815B2 Plasma reactor with reduced electrical skew using electrical bypass elements
有权
使用电旁路元件减少电偏斜的等离子体反应器
- Patent Title: Plasma reactor with reduced electrical skew using electrical bypass elements
- Patent Title (中): 使用电旁路元件减少电偏斜的等离子体反应器
-
Application No.: US11828568Application Date: 2007-07-26
-
Publication No.: US07988815B2Publication Date: 2011-08-02
- Inventor: Shahid Rauf , Kenneth S. Collins , Kallol Bera , Kartik Ramaswamy , Hiroji Hanawa , Andrew Nguyen , Steven C. Shannon , Lawrence Wong , Satoru Kobayashi , Troy S. Detrick , James P. Cruse
- Applicant: Shahid Rauf , Kenneth S. Collins , Kallol Bera , Kartik Ramaswamy , Hiroji Hanawa , Andrew Nguyen , Steven C. Shannon , Lawrence Wong , Satoru Kobayashi , Troy S. Detrick , James P. Cruse
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agent Robert M. Wallace
- Main IPC: C23C16/00
- IPC: C23C16/00 ; H01L21/306
Abstract:
RF ground return current flow is diverted away from asymmetrical features of the reactor chamber by providing bypass current flow paths. One bypass current flow path avoids the pumping port in the chamber floor, and comprises a conductive symmetrical grill extending from the side wall to the grounded pedestal base. Another bypass current flow path avoids the wafer slit valve, and comprises an array of conductive straps bridging the section of the sidewall occupied by the slit valve.
Public/Granted literature
- US20090025878A1 PLASMA REACTOR WITH REDUCED ELECTRICAL SKEW USING ELECTRICAL BYPASS ELEMENTS Public/Granted day:2009-01-29
Information query
IPC分类:
