发明授权
- 专利标题: Light illumination during wafer dicing to prevent aluminum corrosion
- 专利标题(中): 晶圆切割时的光照,防止铝腐蚀
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申请号: US12434637申请日: 2009-05-02
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公开(公告)号: US07998793B2公开(公告)日: 2011-08-16
- 发明人: Takashi Sato , Junichi Takano , Takashi Sato , Tokuo Naitou
- 申请人: Takashi Sato , Junichi Takano , Takashi Sato , Tokuo Naitou
- 申请人地址: JP Kawasaki-shi
- 专利权人: Renesas Electronics Corporation
- 当前专利权人: Renesas Electronics Corporation
- 当前专利权人地址: JP Kawasaki-shi
- 代理机构: Miles & Stockbridge P.C.
- 主分类号: H01L21/00
- IPC分类号: H01L21/00
摘要:
Illumination devices (7a) and (7b) which irradiate light having a wavelength of 1.1 μm or less are arranged on a front surface and a rear surface of a cover (8) of a dicing device (1). After a wafer is placed on a dicing stage (3), when the wafer is diced by a blade (4a) attached to a spindle (5), light is irradiated on an entire surface of an upper surface (element forming surface) of the wafer by the illumination devices (7a) and (7b). At this time, an illuminance of light on the wafer is set at 70 lux or more and 2000 lux or less. By this means, during a dicing operation, an area to be a light-shielded area by the spindle (5) or the like is not present on the wafer.
公开/授权文献
- US20090215247A1 MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE 公开/授权日:2009-08-27
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